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Method for controlling change of image quality of lens

A technology of image quality and lens, applied in the field of controlling the change of lens image quality, can solve problems such as poor image quality, and achieve the effect of good control

Active Publication Date: 2013-09-11
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The present invention aims to solve technical problems in the prior art, such as the poor quality of the image exposed by lithography due to the thermal effect in the lithography process affecting the exposure lens

Method used

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  • Method for controlling change of image quality of lens
  • Method for controlling change of image quality of lens
  • Method for controlling change of image quality of lens

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Embodiment Construction

[0019] In order to make the technical features of the present invention more comprehensible, specific embodiments are given below in conjunction with the accompanying drawings to further describe the present invention.

[0020] See figure 1 , which is a flowchart of a method for controlling image quality variation provided by an embodiment of the present invention.

[0021] The method for controlling image quality change includes the following steps:

[0022] S100, before using the photolithography machine to perform exposure processing, perform preheating or precooling treatment on the lens of the photolithography machine.

[0023] S200 using the photolithography machine to perform an exposure process.

[0024] Using a preheating or precooling mechanism for the lens of the lithography machine can avoid the stage with the fastest change in image quality, so as to better control the image quality at the initial exposure, while the traditional model prediction method cannot co...

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Abstract

The invention discloses a method for controlling the change of image quality of a lens. Before exposure treatment is carried out through a photoetching machine, a lens of the photoetching machine is preheated or precooled. In the method, in the photoetching exposure process, that whether the lens is required to be preheated / precooled is judged by a preheating / precooling mechanism, and a stage that the image quality is changed most quickly can be avoided, so that the imaging quality during primary exposure is better controlled.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a method for controlling changes in lens image quality. Background technique [0002] During the working process of the lithography machine, due to factors such as deformation of the lens after absorbing heat, the image exposed on the silicon wafer will change relative to the ideal image, which will lead to a decrease in the imaging quality of the lithography machine and eventually affect the lithography. machine performance. [0003] The known method of controlling the image quality change caused by the thermal effect of the lens is to predict the image quality parameter through a model, that is, to establish a function model of the thermal effect of the image quality parameter changing with time, and to predict the change of the image quality parameter caused by the lens thermal effect in the actual exposure process , so as to improve the imaging quality of...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 虞晔
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD