16 results about "Exposure treatment" patented technology

The invention discloses an exposure method and exposure equipment, and relates to the technical field of semiconductors, the exposure method comprises the following steps: arranging photomasks on two sides of a base material, and attaching the photomasks on two sides to the base material to form a closed area; the closed area is vacuumized, so that the vacuum degree meets the requirement of exposure treatment; performing trial exposure on the base material to obtain a trial exposure pattern; detecting position deviation data of the trial exposure pattern, and calculating an adjustment parameter B and an adjustment parameter F of the base material; adjusting the base material according to the adjusting parameters, and continuously exposing the base material; the exposure method is executed through exposure equipment, the exposure equipment comprises a feeding device used for conveying a base material, the feeding device adjusts the balance of the base material in the width direction through a balance mechanism, the adjustment parameter B is a balance motor value of the balance mechanism, and the adjustment parameter F is a tension value applied to the base material by the feeding device. According to the exposure method provided by the invention, the quality and the yield of the FMM finished product are improved.

The application discloses a method for constructing a social novelty defect model through catechol exposure of pregnant mice, and belongs to the technical field of disease animal models. The method comprises the following steps: performing catechol exposure treatment on the pregnant mice, feeding the pregnant mice until childbirth, and waiting for the obtained offspring mice to grow to a required age, so as to obtain the social novelty defect model. The method is capable of precisely matching a key time window of embryonic neural development, and adopts a single catechol exposure mode, so that the method is simple to operate, has a high model formation rate, and has a high survival rate of the mother mice and the offspring. In addition, the induced social novelty defect model of the offspring mice is stable in phenotype and strong in specificity, can simulate the cross-generation influence of maternal pregnancy environment exposure on abnormal social functions of offspring young, and is suitable for mechanism research, drug screening and diagnosis marker development of social impairment diseases such as autism.

The invention relates to the technical field of biological detection and toxicological evaluation, and discloses a neural behavior multi-parameter integration-based caenorhabditis elegans exposure evaluation method which comprises the following specific steps: S1, synchronous culture of caenorhabditis elegans; s2, pollutant exposure treatment; s3, multi-parameter behavior detection; s4, data standardization processing; and S5, constructing a comprehensive evaluation model, and performing weighted integration on four core parameters including the movement speed, the chemotactic index, the synaptic spot density and the calcium signal amplitude after standardization to construct a neurotoxicity index NTI. According to the method disclosed by the invention, a multi-layer and multi-dimensional neurotoxicity evaluation system is constructed by integrating four types of neurobehavior parameters including motion behaviors, chemotactic reactions, synaptic morphology and neuron calcium signals, and the defect that a traditional single endpoint index cannot comprehensively reflect overall disturbance of a neural regulation network is overcome; by utilizing the high homology of the nervous system of caenorhabditis elegans and the human nerve gene, the clinical correlation and mechanism analysis capability of environmental pollutant neurotoxicity evaluation are remarkably improved.

This exposure method comprises: a step for continuously executing position detection processing for position detection marks made on a first substrate and a second substrate on a substrate holding section, the second substrate being different from the first substrate; and a step for continuously executing exposure treatment on the basis of the position detection processing results, in which the first substrate and the second substrate on the substrate holding section are exposed to light subjected to prescribed patterning.

The utility model discloses an exposure fixture, relates to the technical field of fixtures, and aims to solve the problems that a required small-size substrate cannot be completely placed on three supporting points of an IC (Integrated Circuit) mask plate photoetching machine platform for exposure treatment, and a large-size substrate is usually cut and edged to form a small-size substrate after exposure treatment in the prior art, so that the working procedures are increased, the production efficiency is high, and the like. And the substrate needs to be repeatedly cleaned and is easily scratched. Comprising a clamping plate, the upper surface of the clamping plate is provided with a clamping groove, and the clamping groove is used for clamping a substrate; and the elastic fixing mechanism is arranged on the clamping plate and located at one end of the clamping groove, and the elastic fixing mechanism is used for clamping and fixing the base plate in the clamping groove.

The application discloses a kind of phobia treatment systems based on immersive VR and gaze adaptive virtual cognitions, at least including scene configuration module, task control module, eye movement data acquisition device, data processing module and psychological intervention module, it is applied to the treatment and training in the aspects such as psychological disorder, social skill based on the virtual cognitions (Virtual Cognitions, VCs) technology of gaze point adaptation, especially for the exposure treatment of phobia patient, the system can be applied in large scale, it is favorable to with more efficient, convenient way, improve the treatment effect of phobia and other psychological disorder diseases, help patient to walk out the gloom of fear.

The present application provides a flexographic printing plate which reduces the ink adhesion problem of ink direct connection of adjoining dot protrusions. A flexographic printing plate characterized by being a flexographic printing plate obtained from a flexographic printing master plate in which a support (A), a photosensitive resin layer (B), and a heat-sensitive mask layer (C) are at least sequentially stacked, and in which dot protrusions, dot valley portions formed between the dot protrusions, and a bottom portion are provided on a surface of the flexographic printing plate, and in which the side surface portions and the bottom portion of the dot valley portions have received the same post-exposure treatment and exposure treatment using a germicidal lamp, the adhesion of the bottom portion of the flexographic printing plate being 2.0 N / mm 2 The following.

The invention relates to a photomask defect pattern correction method and a corresponding device, and the method comprises the steps: obtaining the layout data of a defect pattern, and the defect pattern is a pattern obtained through the exposure processing of a photomask; according to the layout data, constructing a plurality of correction patterns corresponding to the defect pattern in an optical proximity effect correction model; simulating a process of performing exposure treatment on the photomask and generating a defect pattern through the optical proximity effect correction model to obtain a simulated defect pattern; the multiple correction patterns are constructed in the optical proximity effect correction model, the multiple correction patterns are used for correcting the simulated defect pattern at the same time, the number of times of correcting the photomask can be reduced, and the correction efficiency of the photomask can be improved. Therefore, the time for correcting the defect pattern can be prolonged, and the processing efficiency of the defect pattern can be improved.

The invention discloses an exposure machine and an exposure method thereof, and belongs to the technical field of exposure. The exposure machine comprises a base, a conveying mechanism, a feeding mechanism, a cleaning mechanism, an exposure mechanism and a discharging mechanism, and the conveying mechanism is movably arranged on the base and can transfer an object from a feeding area to a discharging area through an exposure area; the feeding mechanism is arranged in the feeding area of the base and can store an object to be exposed and place the object to be exposed on the conveying mechanism. The cleaning mechanism is arranged in the feeding area of the base or located between the feeding area and the exposure area and can clean the surface of an object to be exposed. The exposure mechanism is arranged in the exposure area of the base and can perform exposure treatment on the to-be-exposed object in the exposure area; the discharging mechanism is arranged in the discharging area of the base and can pick up the exposed objects from the conveying mechanism and store the exposed objects in a classified mode. The exposure machine integrates the functions of automatic feeding and discharging, automatic cleaning and the like, and can remarkably improve the production efficiency and the exposure quality.

The invention provides a developing method, which uses a developing fluid containing at least one of a weak acid gas and a weak acid mist to carry out good substrate developing. The developing method includes a developing step of developing a substrate on which a resist coating film is formed and which has been subjected to an exposure treatment, and in the developing step, a developing fluid which is generated from a developing liquid, contains a weak acid gas and / or a weak acid mist, and in which the concentration of the weak acid is adjusted is supplied into a treatment space. And developing the substrate in the processing space.

The application discloses a simulation method and device for photolithography. The simulation method comprises the following steps: obtaining simulation parameters, wherein the simulation parameters comprise optical parameters, post-baking parameters and etching parameters; performing exposure treatment on photoresist arranged on a substrate based on the optical parameters to obtain photoacid distribution information in the photoresist; performing post-baking treatment on the photoresist after the exposure treatment based on the post-baking parameters, and obtaining initial-state inhibitor concentration initial distribution information based on the photoacid distribution information; in the case that the photoresist is a negative photoresist, determining equilibrium-state inhibitor concentration distribution information based on the initial-state inhibitor concentration distribution information; performing development treatment on the photoresist, generating a first 3D topography of the photoresist based on the equilibrium-state inhibitor concentration distribution information; and performing etching on the photoresist based on the first 3D topography and the etching parameters to obtain etched photoresist and a second 3D topography of the substrate. The simulation precision of photolithography can be greatly improved.

The invention provides an optical anti-counterfeiting element and a preparation method thereof. The preparation method of the optical anti-counterfeiting element comprises the following steps: providing a substrate; forming a photosensitive adhesive layer with a first structure on the surface of one side of the substrate; the part of the photosensitive adhesive layer with the first structure is exposed, so that a first area and a second area which are not overlapped with each other are formed on the photosensitive adhesive layer with the first structure, the first area is an area subjected to exposure treatment, and the second area is an area which is not subjected to exposure treatment; the first region at least partially covers the region of the first structure; and at least photoetching the photo-sensitive adhesive layer which is not subjected to exposure treatment and has the first structure, so that the photo-sensitive adhesive layer with the first structure forms a third region with a second structure, and the third region and the photo-sensitive adhesive layer are at least partially overlapped on the surface of the second region and are not overlapped with the first region. The preparation method of the optical anti-counterfeiting element provided by the invention has a precise overlay alignment function, and is beneficial to realizing positioning overlay of the optical anti-counterfeiting element.

The invention discloses a virtual reality technology-based phobia grading exposure treatment system, which comprises a terminal control device and a VR device, and is characterized in that the terminal control device obtains a user instruction, designs a grading exposure treatment scene and a grading exposure treatment program based on the user instruction, obtains a plurality of exposure scenes of different grades and an interaction instruction corresponding to each exposure scene, and displays the interaction instruction on the VR device; the exposure scene and the corresponding interaction instruction and the simulation interaction behavior are sent to the VR device; and the VR device displays the exposed scene, the corresponding interaction instruction and the simulated interaction behavior to the user, obtains user interaction feedback and sends the user interaction feedback to the terminal control device. According to the application, a plurality of virtual scenes of different levels are constructed according to the user instruction, compared with the construction of an actual scene, the cost can be saved, exposure treatment can be better realized to a certain extent, the treatment compliance is further improved by controlling the treatment intensity and the treatment duration of each level, so that the treatment effect is improved to a certain extent, and the user experience is improved. And the safety is ensured.

The invention provides a through-wall type edge exposure unit and gluing and developing equipment, the through-wall type edge exposure unit is applied to the gluing and developing equipment, and the through-wall type edge exposure unit comprises a conveying finger, a telescopic arm, a lifting assembly, a multi-axis linkage platform, an edge exposure assembly and a main control system; the conveying fingers are used for loading wafers, and the telescopic arm is used for driving the conveying fingers for loading the wafers to move towards the lifting assembly; the lifting assembly is used for loading and supporting the wafer to descend, so that the wafer is loaded to the multi-axis linkage platform; the multi-axis linkage platform is used for driving a wafer to move to the edge exposure assembly until the edge exposure process is finished; the edge exposure assembly is used for carrying out exposure treatment on the edge of the wafer; the telescopic arm, the lifting assembly, the multi-axis linkage platform and the edge exposure assembly are electrically connected with the main control system. The method is used for saving the time of the wafer edge exposure process so as to improve the productivity.

The application discloses an energy grid test method of an LDI direct writing exposure machine, which comprises the following steps: S1, obtaining a substrate sample and performing pretreatment; S2, coating ink on the pretreated substrate, baking and curing, and then placing the substrate at a preset position of an exposure machine chuck pad; S3, obtaining an energy test pattern based on a preset proportion of a graphic pixel, and performing exposure treatment on the energy test pattern by using the exposure machine; and S4, developing and reading the energy test pattern obtained after the exposure treatment, and obtaining the energy grid of the energy test pattern. The energy test pattern is directly scanned and imaged onto photosensitive ink by a laser beam through a spatial light modulator, and the energy grid of the pattern is read after development, so that the problem that the service life of an exposure ruler in the prior art is limited and the exposure ruler needs to be replaced regularly and has high cost is solved. Meanwhile, the depreciation of the exposure ruler reduces accuracy, and the infrared function easily causes high heat of the exposure ruler, thereby causing risks such as fire.

The invention relates to the technical field of medical treatment, virtual reality and artificial intelligence crossing, in particular to a VR grading exposure treatment system for anxiety disorder and trauma and stress related disorders. Comprising a wearable skin electric response sensor module, an AI edge computing node, a hierarchical exposure scene management module, an adaptive training trigger module, a scene parameter regulator and a virtual reality head-mounted display rendering unit. The system collects and processes a skin conductance signal in real time to output a stress risk index, so that two types of intervention are intelligently triggered, or when the risk exceeds a threshold value, a multi-stage gradual change instruction is generated to smoothly adjust scene parameters; or suspending exposure and switching to a relaxing scene to start a psychological regulation program. Therefore, the problems of inaccurate treatment, discontinuous experience, high patient falling rate and the like caused by physiological feedback delay, exposure process rigidity and lack of psychological intervention in the process are solved, and the safety, effectiveness and user tolerance of VR exposure treatment are improved.