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Alignment system

An alignment system and alignment mark technology, applied in the field of photolithography, can solve the problems of high engineering difficulty, high requirements for wedge plate manufacturing, assembly and adjustment, and high consistency requirements

Active Publication Date: 2014-02-19
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when using a wedge array, the requirements for the surface shape and wedge angle consistency of the two wedges with the same positive and negative orders of refraction are very high; and the requirements for the manufacturing, assembly and adjustment of the wedge plate group are also very high. It is difficult and expensive to realize the project

Method used

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Embodiment Construction

[0032] In the following, preferred embodiments according to the present invention will be described in detail with reference to the accompanying drawings. For the convenience of describing and highlighting the present invention, relevant components existing in the prior art are omitted from the drawings, and the description of these known components will be omitted.

[0033] figure 1 Shown is a schematic structural view of a lithographic apparatus using the alignment system according to the present invention. The composition of the lithographic apparatus includes: an illumination system 1 for providing an exposure beam; a mask holder and a mask table 3 for supporting a reticle 2 with a mask pattern and alignment marks with a periodic structure RM; a projection optical system 4 for projecting the mask pattern on the reticle 2 onto the wafer 6; a wafer holder for supporting the wafer 6 and a wafer stage 7 with fiducial marks engraved on the wafer stage 7 Reference plate 8 for ...

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Abstract

The invention relates to an alignment system, which comprises: a light source module for supplying the alignment system with necessary alignment beams having at least two propagation directions; an optical stripe formation device used for receiving the above alignment beams of different directions and forming a first optical stripe; an optical module used for receiving the first optical stripe and forming a second optical stripe with the same cycle and direction to a following alignment mark, as well as receiving diffracted beams generated from irradiation of the second optical stripe on the following alignment mark; an alignment mark with a certain cycle and arranged at least along two directions for receiving the second optical stripe and making it diffract; and a photoelectric detector which is disposed between the optical module and the optical stripe formation device for receiving and measuring the intensity of the above diffracted beams, as well as determining an alignment position by means of the phase information reflected by light intensity changes.

Description

technical field [0001] The invention relates to the field of lithography, and in particular to an alignment system used in a lithography device. Background technique [0002] The photolithography apparatus in the prior art is mainly used in the manufacture of integrated circuits (ICs) or other micro devices. Through a photolithography device, multi-layer masks with different mask patterns are sequentially imaged under precise alignment on a photoresist-coated silicon wafer, such as a semiconductor silicon wafer or an LCD panel. Lithography devices are generally divided into two categories, one is stepping lithography devices, the mask pattern is exposed and imaged on one exposure area of ​​the silicon wafer, and then the silicon wafer moves relative to the mask to move the next exposure area to the mask. Underneath the mask pattern and the projection objective lens, the mask pattern is exposed to another exposed area of ​​the silicon wafer again, and the process is repeated...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F9/00G03F7/20
Inventor 杜聚有
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD