Ultralow capacitance transient voltage suppression device and manufacturing method thereof
A technology of transient voltage suppression and manufacturing methods, which is applied in semiconductor/solid-state device manufacturing, electric solid-state devices, electrical components, etc., can solve the problems of device performance impact and high cost, and achieve high performance and low cost
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[0067] In the prior art, the upper diode, the lower diode and the TVS tube in the ultra-low capacitance TVS device all use discrete devices, the cost is high, and the performance is affected by the properties of the connecting wire material.
[0068] In the ultra-low-capacity transient voltage suppression device and its forming method according to the embodiment of the present invention, the upper diode, the lower diode and the TVS tube are all integrated on the same P+ semiconductor substrate, which is beneficial to realize low cost and high performance.
[0069] In addition, in this embodiment, the P+ isolation region extends to contact with the P+ semiconductor substrate, so that the P+ semiconductor substrate can be used as the ground GND electrode, and there is no need to lead the electrode from the front side, which is not only beneficial to reducing the chip size, but also applicable to A variety of different packaging forms, in addition, the P+ semiconductor substrate i...
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