Particle rendering optimization method

An optimization method and particle optimization technology, applied in the processing of 3D images, image data processing, instruments, etc., can solve the problems of not very high detail requirements, reduced number of drawing frames, and high redraw rate, so as to improve performance and consumption. controllable effect

Inactive Publication Date: 2013-01-30
SHENYANG CHUANGDA TECH TRADE MARKET
View PDF0 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

And the worse situation is that the camera is located in this effect, causing the effect to almost fill the screen, and at the same time it has a ve

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] An optimization method for particle rendering, the main steps of which are as follows:

[0019] 1) According to the zoom factor, in order to draw off-screen particles, create a new rendering target;

[0020] 2) Draw the particles into the newly created render target;

[0021] 3) Soften the edges of the particles;

[0022] 4) Create a new screen effect, use off-screen particles as textures, and draw them on the main frame buffer;

[0023] The particle optimization method is suitable for soft and fuzzy particles, and the particles with low resolution are used to replace high-resolution particles so that there will be no obvious distortion;

[0024] The application environment of the particle optimization method is that the particles themselves and the pixels of the scene are superimposed;

[0025] The particle optimization method uses overlay pixels to blur the edges of pixels.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a particle rendering optimization method, in particular to a rendering optimization method of particles with a high fill rate, which belongs to the technical field of computer graphics. By using off-screen rendering with low resolution, the performance can be greatly improved, and the consumption of a particle system can be more controllable. Although distortion cannot be completely eliminated, an acceptable rendering effect can be achieved by improvement with a fuzzy method, a stencil buffer method and the like.

Description

[0001] technical field [0002] The invention relates to a rendering optimization method, in particular to a rendering optimization method for particles with a high filling rate, which belongs to the technical field of computer graphics. Background technique [0003] With the development of rendering technology, there are higher requirements for scene rendering in the production of various large-scale 3D online games. In order to meet the higher requirements of players, a large number of particle systems are commonly used to model various scene effects, such as fireworks, explosions, various weather effects, etc. [0004] Particle systems need to simulate complex motion systems, such as a snowstorm or an explosion, which require a large number of triangles to be drawn. And what's worse is that the camera is in this effect, causing the effect to almost fill the screen, and it has a very high redraw rate, resulting in a drop in the number of frames drawn. [0005] Then, ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G06T15/00
Inventor 温宏梅
Owner SHENYANG CHUANGDA TECH TRADE MARKET
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap