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Method for manufacturing a transparent conductive film

A technology of transparent conductivity and manufacturing method, applied in the direction of cable/conductor manufacturing, equipment for manufacturing conductive/semiconductive layers, circuits, etc., can solve the problem of reducing film conveying speed, increasing the length of heating furnace, and huge equipment and other issues to achieve the effect of optimizing the crystallization process and improving productivity

Pending Publication Date: 2013-03-13
NITTO DENKO CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when such a long heating process is carried out by the roll-to-roll method, it is necessary to increase the furnace length of the heating furnace or to reduce the conveying speed of the film. The former requires huge equipment, and the latter requires a large sacrifice in productivity.
Therefore, it is considered that the crystallization of an indium-based composite oxide film such as ITO by heating a single piece batchwise is advantageous in terms of cost and productivity, and this process is not suitable for the roll-to-roll method.

Method used

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  • Method for manufacturing a transparent conductive film
  • Method for manufacturing a transparent conductive film
  • Method for manufacturing a transparent conductive film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0102] (formation of anchor layer)

[0103] Two layers were formed on a biaxially stretched polyethylene terephthalate film (manufactured by Mitsubishi Plastics Corporation, trade name "DIAFOIL", glass transition temperature 80°C, refractive index 1.66) with a thickness of 23 μm by a roll-to-roll method base coat. First, a thermosetting resin composition containing a melamine resin:alkyd resin:organosilane condensate in a weight ratio of 2:2:1 in terms of solid content was diluted with methyl ethyl ketone so that the solid content concentration was 8% by weight. This solution was coated on one main surface of a PET film, and heated and cured at 150° C. for 2 minutes to form a first undercoat layer with a film thickness of 150 nm and a refractive index of 1.54.

[0104] A silicone-based thermosetting resin (manufactured by COLCOAT CO., Ltd., trade name "COLCOAT P") was diluted with methyl ethyl ketone so that the solid content concentration was 1% by weight. Apply this soluti...

Embodiment 2

[0111] In Example 2, in the same manner as in Example 1, a wound body of a transparent conductive thin film formed with a crystalline ITO film was formed, but only when the transport tension per unit width in the furnace in the crystallization process was set to 51N The aspect of / m is different from Example 1.

Embodiment 3

[0113] In Example 3, in the same manner as in Example 1, a wound body of a transparent conductive thin film formed with a crystalline ITO film was formed, but only when the transport tension per unit width in the furnace in the crystallization process was set to 65N The aspect of / m is different from Example 1.

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Abstract

Disclosed is a method for manufacturing a long transparent conductive film comprising a crystalline iridium composite oxide film formed on a transparent film substrate. Said method includes: an amorphous laminate formation step in which an amorphous iridium complex oxide film that contains iridium and a tetravalent metal is formed on a long transparent film substrate by a sputtering method; and a crystallization step in which the long transparent film substrate on which the aforementioned amorphous film is formed is continuously fed into a furnace and the amorphous film is crystallized. The mass of the tetravalent metal in the aforementioned iridium complex oxide preferably constitutes more than 0% and no more than 15% of the combined mass of the iridium and the tetravalent metal.

Description

technical field [0001] The present invention relates to a method for producing a transparent conductive film in which a crystalline transparent conductive film is formed on a transparent film substrate. Background technique [0002] Transparent conductive films in which transparent conductive films are formed on transparent film substrates are widely used in solar cells, transparent electrodes for inorganic EL elements, organic EL elements, electromagnetic wave shielding materials, touch panels, and the like. Especially in recent years, the mounting rate of touch panels in mobile phones, portable game machines, etc. has increased, and the demand for transparent conductive films for capacitive touch panels capable of multi-point detection has rapidly expanded. [0003] As a transparent conductive film used in touch panels, etc., a flexible transparent substrate such as polyethylene terephthalate film, in which a conductive metal oxide film such as indium-tin composite oxide (...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/08B32B9/00C23C14/58H01B13/00
CPCC23C14/024C23C14/086C23C14/5806C23C14/562H01B13/00H01B13/0026C23C14/34C23C14/08B32B9/00C23C14/58
Inventor 山崎由佳梨木智刚菅原英男
Owner NITTO DENKO CORP