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Device for cleaning eraser in photoresist coating process and photoresist coating machine

A technology of eraser and photoresist, applied in the direction of surface coating liquid device, spray device, spray device, etc., can solve the problems of prolonging cleaning time, increasing production cost, increasing flow rate, etc., to achieve enhanced cleaning ability, The effect of saving production cost

Active Publication Date: 2016-01-13
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

To achieve a stable cleaning effect, the traditional cleaning nozzle needs to increase the flow rate or prolong the cleaning time, which increases the production cost

Method used

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  • Device for cleaning eraser in photoresist coating process and photoresist coating machine
  • Device for cleaning eraser in photoresist coating process and photoresist coating machine
  • Device for cleaning eraser in photoresist coating process and photoresist coating machine

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Embodiment Construction

[0024] The technical solutions of the present invention will be further described below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0025] The invention provides a device for cleaning an eraser in a photoresist coating process.

[0026] refer to Figure 2 to Figure 9 as shown, figure 2 It is a structural schematic diagram of an embodiment of the device for cleaning the eraser in the photoresist coating process of the present invention; image 3 It is a structural schematic diagram of another embodiment of the device for cleaning the eraser in the photoresist coating process of the present invention; Figure 4 It is a structural schematic diagram of another embodiment of the device for cleaning the eraser in the photoresist coating process of the present invention; Figure 5 It is a structural...

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Abstract

An apparatus for cleaning a rubber eraser in a photoresist coating process, and a photoresist coating machine are provided. The apparatus comprises a cleaning table, and a nozzle disposed on the cleaning table, a liquid outlet of the nozzle facing towards the cleaning table. A conical inner cavity is formed in the nozzle. A cone-tip portion of the conical inner cavity is a liquid outlet of the nozzle. By using the apparatus, production costs can be saved, intensity of cleaning the rubber eraser in the photoresist coating process is enhanced, and quality of photoresist coating can be improved.

Description

technical field [0001] The invention relates to the technical field of LCD color film photoresist coating, in particular to a device for cleaning an eraser in a photoresist coating process and a photoresist coating machine. Background technique [0002] The high-speed coating machine (Coater) in the flat panel display manufacturing industry needs to perform a "pre-spray" action before glass coating. Resist (PR, PhotoResist) and "pre-spit" photoresist residue, need to use eraser (Rubber, Wiper) to clean the spit out part of the coating nozzle, and use chemical solvent to clean the eraser surface before the next pre-spit. Since the residual photoresist on the coating nozzle is mainly cleaned by an eraser, especially the solid content of the color filter photoresist is very high, and the pigment molecules in the photoresist are in a "suspended state" in the chemical solvent, so it is easy to condense and difficult to clean. Re-dispersed in solvent, it is easy to form "Gel" (ph...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B3/02B08B3/04B05C5/00B05B1/34
CPCB05B1/34G03F7/16H01L21/67051H01L21/6715
Inventor 陈晖林智生
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD