Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A Simple Adjustable X-Type Optical Path Parallel Debugging Detection Device

A detection device and an adjustable technology, applied in the direction of measuring devices, optical devices, instruments, etc., can solve the problems of complex manufacturing process and high detection cost, and achieve the effect of solving optical axis misalignment, easy operation and simple structure

Active Publication Date: 2016-03-09
INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, most of the calibration methods used are the concave plane mirror method, the collimator method, and the inspection method based on CCD image processing technology. These methods are relatively complex in manufacturing process and high in detection cost.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A Simple Adjustable X-Type Optical Path Parallel Debugging Detection Device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0014] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0015] In the following description, numerous specific details are provided, such as descriptions of optical components, to provide a thorough understanding of embodiments of the invention. However, the invention applies not only to one or more of the specific descriptions, but also to other parameters and materials and the like. The examples set forth below in the specification are illustrative and not restrictive.

[0016] figure 1 A schematic structural diagram of a simple adjustable X-type optical path parallel debugging and detection device in the present invention is shown. Such as figure 1 As shown, the device includes a device main body support 1, a first aperture stop 2, a combination structure 3 of a first pl...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a simple adjustable X-type light path parallel debugging detection device. The device comprises a main device support, a first to-be-calibrated parallel light path, a first aperture diaphragm, a first planar mirror and aperture diaphragm combination structure, a second planar mirror and aperture diaphragm combination structure, a second aperture diaphragm and a second to-be-calibrated parallel light path. The main device support is used for fixing and connecting the first aperture diaphragm, the first planar mirror and aperture diaphragm combination structure, the second aperture diaphragm and the second planar mirror and aperture diaphragm combination structure. The first to-be-calibrated parallel light path is sued for emitting an observation beam. The first aperture diaphragm is used for limiting the beam aperture of the observation beam. The first planar mirror and aperture diaphragm combination structure is used for determining a transmission path of the observation beam via the first aperture diaphragm. The second planar mirror and aperture diaphragm combination structure is used for determining a transmission path of an observation beam transmitted from the first planar mirror and aperture diaphragm combination structure. The second aperture diaphragm is used for limiting the beam aperture of an observation beam transmitted from the second planar mirror and aperture diaphragm combination structure. The second to-be-calibrated parallel light path is used for receiving the observation beam passing the second aperture diaphragm.

Description

technical field [0001] The invention relates to the field of laser measurement technology and application, in particular to a simple adjustable X-type optical path parallel debugging and detection device, which has the characteristics of simple structure, easy portability and easy operation. Background technique [0002] The laser range finder is playing an increasingly important role in modern weapon control systems. In order to ensure accurate and reliable distance data for the weapon control system, the three optical axes of the laser range finder are required, namely, the laser emitting optical axis, the laser receiving optical axis, Aim the optical axis with as small a parallelism error as possible. However, when the laser range finder is used in transportation and field conditions, the optical axis is often misaligned. The non-parallel optical axis will inevitably affect the distance measuring ability of the distance measuring machine, and in serious cases, the distan...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/26
Inventor 林学春杨盈莹赵伟芳王文婷伊肖静张玲于海娟
Owner INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com