Vamp rain-shielding dust-retention cover
A technology for blocking dust cover and upper, which is applied to shoe uppers, footwear, boot legs, etc., can solve problems such as unpleasant mood, business impact, and unbearable dirt on the upper that affects instruments.
Inactive Publication Date: 2013-10-23
ZHAOYUAN YUNFAN HARDWARE MACHINERY
View PDF0 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0002] At present, when there is a rainy day or when walking on a road with more dust and dirt, the leather shoes worn by people will be drenched in the rain or stained by dirt, which not only makes the dirt on the shoe surface unbearable and affects the instrument, but also makes people feel uncomfortable. If you can cover the uppers on rainy days or when you are walking on a road with a lot of dirt, it will avoid water and dust on the uppers, and it will not cause a lot of embarrassment. and unpleasant
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0009] The present invention will be further described below in conjunction with the drawings.
[0010] In the view, under the shoe-shaped cover 1 is the support rod 2, the support rod 2 is connected to the tie rod 3, and the tie rod 3 is provided with a hook 4. When using, hang the hook 4 on the shoe mouth, and the cover 1 will Cover rainwater and dirt, rinse it with water after use, and carry it in a plastic bag for later use.
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More
Abstract
The invention relates to a vamp rain-shielding dust-retention cover, a supporting rod is arranged below a vamp-type shielding face and connected with a pull rod, and a hook is arranged on the pull rod. Rain shielding and ash retention are carried out through the vamp rain-shielding dust-retention cover when needed, and filthy vamps and unpleasantness caused by the filthy vamps are prevented.
Description
Technical field [0001] The invention relates to a rain-shielding and dust-shielding cover for shoe uppers, which is used to cover dust, moisture and dirt on people's rain-proof dirt road in rainy days. Background technique [0002] At present, when it rains or when walking on dusty and dirty roads, the leather shoes people wear will get wet or stained by dust, which not only makes the vamp dirty and affects the instrument, but also makes people feel bad. Pleasant, sometimes it also affects the business or the time to participate in the meeting. If you can cover the shoe upper in rainy weather or when walking on the road with more dirt, it will avoid water and dust on the shoe surface, and it will not cause a lot of embarrassment. And unpleasant. Summary of the invention [0003] In order to solve the above-mentioned problems, the present invention provides a shoe upper rain-shielding and dust-shielding cover, which shields rain and dust when necessary, and prevents the shoe upper...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A43B23/00
Inventor 赵岳鹏
Owner ZHAOYUAN YUNFAN HARDWARE MACHINERY
Who we serve
- R&D Engineer
- R&D Manager
- IP Professional
Why Patsnap Eureka
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com