An inorganic all-solid-state electrochromic device and its preparation method

An electrochromic device and electrochromic layer technology, applied in instruments, ion implantation plating, coating, etc., can solve the problems of increased response time, unfavorable rapid discoloration, performance degradation, etc., to extend service life and shorten discoloration Response time, the effect of reducing residual charge

Active Publication Date: 2015-11-18
天津南玻节能玻璃有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, during the discoloration process of the device, ions need to migrate across the film between the electrochromic layer, the ion-conducting layer and the ion storage layer, which will cause charge residues and performance degradation during repeated use; at the same time, it will also cause ion migration. The medium response time increases, which is not conducive to the purpose of rapid color change

Method used

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  • An inorganic all-solid-state electrochromic device and its preparation method
  • An inorganic all-solid-state electrochromic device and its preparation method
  • An inorganic all-solid-state electrochromic device and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] Preparation with ZAO / WO 3 / Li 4 Ti 5 o 12 Inorganic all-solid-state electrochromic devices with / ZAO structure and film thicknesses of 800nm / 500nm / 250nm / 800nm ​​in sequence.

[0022] (1) Wash a 2×3cm glass substrate in acetone, absolute ethanol and deionized water in sequence, and place it in a vacuum magnetron sputtering system after drying, and vacuumize to 2×10 -6 Pa.

[0023] (2) Pre-sputtering (burning target) for 20 minutes, using the following parameters to prepare a ZAO film on a glass substrate:

[0024] Target material: sintered body of zinc oxide and alumina (mass fraction of alumina 5%)

[0025] Sputtering type: DC sputtering

[0026] Target base distance: 8cm

[0027] Deposition pressure: 0.5Pa

[0028] Sputtering power: 400W

[0029] Film thickness: 800nm

[0030] (3) Pre-sputtering (burning target) for 20 minutes, using the following parameters to prepare WO on the ZAO film 3 film:

[0031] Target material: metal tungsten

[0032] Sputtering ...

Embodiment 2

[0049] Preparation with ZAO / WO 3 / Li 4 Ti 5 o 12 Inorganic all-solid-state electrochromic devices with / ZAO structure and film thicknesses of 600nm / 400nm / 250nm / 600nm in sequence.

[0050] (1) Wash a 2×3cm glass substrate in acetone, absolute ethanol and deionized water in sequence, and place it in a vacuum magnetron sputtering system after drying, and vacuumize to 2×10 -6 Pa.

[0051] (2) Pre-sputtering (burning target) for 20 minutes, using the following parameters to prepare a ZAO film on a glass substrate:

[0052] Target material: sintered body of zinc oxide and alumina (mass fraction of alumina 5%)

[0053] Sputtering type: DC sputtering

[0054] Target base distance: 8cm

[0055] Deposition pressure: 0.5Pa

[0056] Sputtering power: 300W

[0057] Film thickness: 600nm

[0058] (3) Pre-sputtering (burning target) for 20 minutes, using the following parameters to prepare WO on the ZAO film 3 film:

[0059] Target material: metal tungsten

[0060] Sputtering ty...

Embodiment 3

[0077] Preparation with ZAO / WO 3 / Li 4 Ti 5 o 12 Inorganic all-solid-state electrochromic devices with / ZAO structure and film thicknesses of 700nm / 600nm / 250nm / 700nm in sequence.

[0078] (1) Wash a 2×3cm glass substrate in acetone, absolute ethanol and deionized water in sequence, and place it in a vacuum magnetron sputtering system after drying, and vacuumize to 2×10 -6 Pa.

[0079] (2) Pre-sputtering (burning target) for 20 minutes, using the following parameters to prepare a ZAO film on a glass substrate:

[0080] Target material: sintered body of zinc oxide and alumina (mass fraction of alumina 5%)

[0081] Sputtering type: DC sputtering

[0082] Target base distance: 8cm

[0083] Deposition pressure: 0.5Pa

[0084] Sputtering power: 350W

[0085] Film thickness: 700nm

[0086] (3) Pre-sputtering (burning target) for 20 minutes, using the following parameters to prepare WO on the ZAO film 3 film:

[0087] Target material: metal tungsten

[0088] Sputtering ty...

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Abstract

The invention relates to an inorganic all-solid electrochromic device adopting an optimized structure, which structurally comprises a glass substrate, a transparent conducting layer A, an electrochromic layer, an ionic conducting layer and a transparent conducting layer B, wherein the transparent conducting layer A, the electrochromic layer, the ionic conducting layer and the transparent conducting layer B are deposited on the glass substrate in sequence; both the transparent conducting layer A and the transparent conducting layer B are Al-doped ZnO (ZAO) thin films; the electrochromic layer is a tungsten oxide (WO3) thin film; the ionic conducting layer is a lithium titanate (Li4Ti5O12) thin film. The thin film structure of the electrochromic device is simplified from the traditional five layers into four layers, so that the performance of the electrochromic device is optimized while the technology is simplified and the cost is reduced.

Description

technical field [0001] The invention relates to an electrochromic device, in particular to a device for making multi-layer inorganic thin films on glass. The device realizes discoloration through voltage control, so as to achieve the purpose of changing light transmittance, and belongs to the technical field of dimming glass. Background technique [0002] Electrochromic devices have a wide range of applications and development prospects in technical fields such as glare-free mirrors, displays, building energy-saving glass, and aerospace temperature control devices. Among them, the electrochromic technology with an all-solid-state inorganic multilayer film structure has attracted widespread attention due to its advantages such as high environmental adaptability, good device performance stability, and strong industrial applicability. The traditional all-solid-state electrochromic device has a five-layer film structure, that is, the basic structure between two pieces of glass i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/153C23C14/35C23C14/06C23C14/08
Inventor 王烁胡冰刘双
Owner 天津南玻节能玻璃有限公司
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