Blending method and blending device for resist stripping solution

A resist and stripping solution technology, which is applied in the field of resist stripping solution blending and blending devices, can solve the problems of non-practical processing methods, not cheap, costly, etc., and achieve shortening of production cycle time and cost reduction , reduce the effect of bad harmony

Active Publication Date: 2018-11-09
PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] These solvents are used in large quantities and are decidedly not cheap
Also, since it is not a non-toxic organic solvent, it cannot be discharged directly into the environment
In addition, from the viewpoint of resource recycling, separation into individual solvent components and recycling of resources is the most effective treatment method, but separation / purification until individual solvents can be reused is not a practical treatment method in terms of cost
In general, used stripping fluid is often used as a combustion aid, but since the stripping fluid sometimes contains water and is used in large quantities, it is costly to decompose it by burning it

Method used

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  • Blending method and blending device for resist stripping solution
  • Blending method and blending device for resist stripping solution

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Embodiment Construction

[0048] Hereinafter, the preparation method and apparatus of the resist stripping liquid of this invention are demonstrated using drawing. In addition, the following description is description of one embodiment of this invention, this invention is not limited to the following description, It can change in the range which does not deviate from the summary of this invention.

[0049] figure 1 The preparation apparatus 1 of the resist stripping liquid of this invention is shown. The resist stripping solution of the present invention has been described for the preparation of a resist stripping solution that does not use additives for preventing corrosion of metal wiring, but it can also be adjusted depending on the pH of the solution, the mixing ratio, and the type of material of the metal wiring. Appropriately adding trace amounts of additives to pure water, figure 1In the blending device 1 of , the case where an additive is added will be described.

[0050] The blending devi...

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Abstract

The invention provides an anti-corrosion agent stripping liquid mixing method and device. The mixing method includes the steps of: weighing the anti-corrosion agent stripping regenerated liquid of a regenerated liquid input quantity in a solvent trough; measuring the concentration of a first solvent in the solvent trough; calculating the concentration of a second solvent; calculating the additional input of the first solvent based on a specified amount, the regenerated liquid input quantity and the concentration of the first solvent; calculating the additional input of the second solvent based on a specified amount, the regenerated liquid input quantity and the concentration of the second solvent; inputting the first solvent of the first solvent additional input and the second solvent of the second solvent additional input into the solvent trough so as to obtain a mixing solvent; supplying pure water of a reserved quantity to a mixing trough and meanwhile weighing the pure water; and conveying the mixing solvent to the mixing trough from the solvent trough so as to obtain an anti-corrosion agent stripping liquid.

Description

technical field [0001] The present invention relates to a mixing method and a mixing device for separating a solvent component from a used resist stripping solution and reblending the solution obtained as a resist stripping regeneration solution into a resist stripping solution. Background technique [0002] Photolithography is mostly used in the manufacture of semiconductors, liquid crystal displays, organic and inorganic EL displays. Here, a thin film of material is formed on a substrate, and a pattern is formed thereon with a resist. Then, an etching process is performed according to the resist pattern to form a desired pattern on the material thin film. And, finally, the remaining resist is peeled off. [0003] The resist is a photosensitive resin material, for example, novolac resin etc. are used suitably. Therefore, a solvent-based stripper is used to strip the resist. For example, a mixture of monoethanolamine and dimethyl sulfoxide, a mixture of propylene glycol ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/42
Inventor 井上恭井城大世小林繁増田义登
Owner PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTD
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