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Substrate heating device and method

A technology of heating device and heating method, which is applied in the direction of electric furnace heating, furnace control device, lighting and heating equipment, etc., which can solve the problems of precise control and inability to achieve uniform temperature of the substrate, and achieve the effect of uniform temperature

Active Publication Date: 2014-04-23
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method of controlling the temperature uniformity of the substrate only through the heater can only make the temperature of each area of ​​the substrate basically uniform, and cannot achieve the effect of accurately controlling the temperature uniformity of the substrate.

Method used

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  • Substrate heating device and method
  • Substrate heating device and method

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Embodiment Construction

[0028] It should be understood that the specific embodiments described herein are only used to explain the present invention, but not to limit the present invention.

[0029] The invention provides a substrate heating device.

[0030] Reference figure 1 , figure 1 for figure 1 It is a schematic flowchart of an embodiment of a substrate heating device of the present invention.

[0031] In an embodiment, the substrate heating device includes a heating furnace 10, a platform 20, a substrate 30 to be heated, and a plurality of heaters 40. Among them, the substrate 30 is placed on the platform 20, and the platform 20 and the substrate 30 are placed in the heating furnace 10; a plurality of heaters 40 are arranged in the heating furnace 10 at intervals and located above the substrate 30. 40 heats the substrate 30, and the spacing distance of the heaters 40 can be set to be equal or non-equal spacing according to actual needs to ensure that the heating area of ​​the multiple heaters 40 can...

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Abstract

The invention discloses a substrate heating device. The device comprises a heating furnace, a platform in the heating furnace, a to-be-heated substrate arranged on the platform, a plurality of heaters, reflective sheets and a rotation controller. The plurality of heaters for heating the substrate are arranged at intervals above the substrate, the reflective sheet is fixed above each of the plurality of heaters, and the rotation controller is fixed on the inner surface of the heating furnace wall and used for controlling the rotation of the reflective sheets. The invention further discloses a substrate heating method. By means of the device and the method, temperatures of all regions on the substrate are uniform, and the temperature uniformity of the substrate is controlled accurately.

Description

Technical field [0001] The present invention relates to the technical field of liquid crystal display, in particular to a heating device and method. Background technique [0002] At present, when the substrate is heated by the large-generation high-temperature furnace, the different hot spots of the substrate are heated by heaters set in different areas of the heating furnace, and the power of each heater is independently controlled to adjust the substrate heating The uniformity of temperature achieves the effect of making the temperature of each area of ​​the substrate basically uniform. However, this method of controlling the temperature uniformity of the substrate only through the heater can only make the temperature of each area of ​​the substrate basically uniform, but cannot achieve the effect of accurately controlling the temperature uniformity of the substrate. [0003] The foregoing content is only used to assist in understanding the technical solution of the present inve...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F27D19/00
CPCF27B9/36F27B9/40F27D11/02F27D11/12F27D19/00F27D21/00F27D21/0014F27D2019/0003H01L21/67109H01L21/67115H01L21/67248F27D5/0037
Inventor 覃事建
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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