Method for aligning reticle and substrate and method for manufacturing color filter substrate
A color filter substrate and substrate pairing technology, which is applied in the manufacturing field of color filter substrates, can solve problems such as low efficiency of masks and substrates, and reduce production efficiency, so as to facilitate alignment confirmation, improve production efficiency, and reduce alignment errors The effect of the probability
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[0042] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0043] The method for aligning the reticle and the substrate according to the first embodiment of the present invention, such as Figure 4 shown, including the following steps:
[0044] Step 001: Form at least one set of substrate alignment marks on the substrate, each set of substrate alignment marks includes n substrate alignment marks, and the n substrate alignment marks are substrate alignment marks of X types of shapes, where n is the number of sub-pixels ...
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