Automatic aligner
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- AVARY HLDG (SHENZHEN) CO LTD
- Publication Date
- 2009-06-10
- Estimated Expiration
- Not applicable · inactive patent
Smart Images
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Abstract
Description
technical field
[0001] The invention relates to an automatic alignment device, in particular to an automatic alignment device applied to the exposure positioning of a circuit substrate. Background technique
[0002] The production of the conductive circuit of the printed circuit board is to transfer the circuit image preset on the photomask to the photosensitive material such as the dry film on the substrate through the exposure and development process, and then form the required circuit on the substrate through the etching process. line. See literature, Moon-Youn Jung, Won Ick Jang, Chang Auck Choi, Myung Rae Lee, Chi Hoon Jun, Youn Tae Kim; Novel lithography process for extreme deep trench by using laminated negative dry film resist; 2004: 685-688; 2004.17 th IEEE International Conference on Micro Electro Mechanical Systems. During the exposure process, the photomask must be aligned with the substrate to ensure the accuracy of the exposure imaging position and the qualit...