Drawing device and drawing method
A technology of main scanning direction and sub-scanning, which is applied in the direction of exposure device, optics, and optomechanical equipment in the photolithography process, which can solve the problems that the automatic focusing mechanism cannot function normally, and the drawing accuracy of the band-shaped area is reduced, so as to improve the drawing Accuracy, easy parts management, effect of equipment cost reduction
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[0068] Hereinafter, embodiments of the present invention will be described with reference to the drawings. In addition, in the drawings, in order to facilitate understanding, the size and number of each part may be exaggerated or simplified.
[0069]
[0070] figure 1 It is a perspective view showing an overview of the drawing device 100 of the embodiment. In addition, figure 2 It is a plan view showing an overview of the drawing device 100. and, image 3 It is a bus wiring diagram of the drawing device 100. in figure 1 Here, for the convenience of illustration and description, the Z-axis direction is defined as the vertical direction, and the XY plane is the horizontal plane. However, this is defined to facilitate understanding of the positional relationship and does not limit the directions described below. The same applies to the following figures. In addition, in figure 2 Here, for convenience of description, the bridge structure 11 and the optical head 33 are indicated ...
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