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Exposure drawing device and exposure drawing method

A drawing device and exposed technology, applied in the field of drawing circuit patterns and exposure drawing, which can solve problems such as error handling and stoppage

Active Publication Date: 2016-06-29
ADTEC ENG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, when multiple jobs are executed, if the recording medium to be processed becomes insufficient, or the type and size of the conveyed recording medium differ from the recording medium set in the job, the processing cannot be continued, and an error occurs. instead of stopping the processing

Method used

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  • Exposure drawing device and exposure drawing method
  • Exposure drawing device and exposure drawing method
  • Exposure drawing device and exposure drawing method

Examples

Experimental program
Comparison scheme
Effect test

no. 1 approach 〕

[0047] Hereinafter, the exposure drawing system which concerns on 1st Embodiment is demonstrated in detail using drawing. In addition, in the first embodiment, as the exposure drawing system 1, a system in which flat substrates such as printed circuit boards and glass substrates for flat panel System for exposure drawing on one or both sides.

[0048] figure 1 It is a configuration diagram showing the overall configuration of the exposure drawing system 1 according to the first embodiment. Such as figure 1 As shown, the exposure drawing system 1 includes: an exposure drawing device 2 for drawing an image such as a circuit pattern by exposing a light beam on a substrate to be exposed (substrate C to be described later), and a controller for controlling the exposure drawing by the exposure drawing device 2 device 3.

[0049] figure 2 It is a perspective view which shows the internal structure of the exposure drawing apparatus 2 which concerns on 1st Embodiment. In additio...

no. 2 approach 〕

[0120] Hereinafter, the exposure drawing system 1 which concerns on 2nd Embodiment is demonstrated in detail, referring drawings. In addition, the exposure drawing system 1 which concerns on 2nd Embodiment is similar to the exposure drawing system 1 which concerns on 1st Embodiment, and has Figure 1 to Figure 5 Since the structure shown is not shown, the repeated description related to this structure will be omitted.

[0121] In the exposure drawing system 1 according to the first embodiment, when a plurality of jobs are executed in accordance with a predetermined execution order, the substrate type of the exposed substrate C is estimated from the size of the exposed substrate C, the position of an alignment mark, and the like. When the estimated substrate type is different from the substrate type set in the job, it is determined that the job is different. However, in the exposure drawing system 1 according to the second embodiment, the size of the exposed substrate C to be e...

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PUM

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Abstract

Disclosed is an exposure / drawing device whereby, when continuously carrying out a plurality of jobs, unnecessary line discontinuance can be suppressed, while avoiding unwanted exposure processing as far as possible. There are provided: exposure processing execution means wherein respective items of substrate information are set, and whereby respective exposure processes are sequentially carried out on a substrate in accordance with a plurality of exposure processing requests for exposure processing; detection means that detects the substrate information of a substrate that is to be subjected to exposure processing; and comparison means that compares the detected substrate information with substrate information during execution that was set in the exposure processing request. If, based on the comparison result, it is found that the detected substrate information of the substrate that is next to be subjected to exposure processing is the same as the information of the substrate whose processing is currently being executed, the exposure processing request that is currently being executed is continued with in respect of the substrate that is next to be subjected to exposure processing. If it is found that the detected substrate information is different from the substrate information that is currently being executed but the substrate information that was set in the next exposure processing request is the same, execution of the next exposure processing request is commenced on termination of the exposure processing request that is currently being executed.

Description

technical field [0001] The present invention relates to an exposure drawing device and an exposure drawing method, in particular to an exposure drawing device for drawing a circuit pattern by exposing a substrate to be exposed to a light beam, a program executed by the exposure and drawing device, and a method for drawing a circuit pattern by exposing a substrate to be exposed to a light beam Exposure profile method. Background technique [0002] Conventionally, when a plurality of processing requests are continuously issued to devices such as an image recording device and an exposure drawing device, a plurality of processing requests associated with one request are combined into one job, and the processing requests are sequentially processed in the order in which they are generated. Execute multiple jobs sequentially. At this time, at the stage when the processing of the processing number of sheets set in the job being executed is completed, the job being executed is termi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H01L21/027
CPCG03F7/20G03F7/2002
Inventor 桥口昭浩
Owner ADTEC ENG