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Stripping composition for color photoresists and organic insulating films

A technology of organic insulating film and color photoresist, which is applied in the direction of photosensitive material processing, etc., can solve the problem of not being able to remove color photoresist and organic insulating film at high speed at the same time, and the ability to remove color photoresist becomes poor.

Active Publication Date: 2019-11-26
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the problem with this stripping composition is that due to the use of hydroxylamine, the stripping composition will volatilize at high temperature, thereby deteriorating the ability to remove color photoresist during long-term use; Removal of color photoresists and organic insulating films

Method used

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  • Stripping composition for color photoresists and organic insulating films
  • Stripping composition for color photoresists and organic insulating films
  • Stripping composition for color photoresists and organic insulating films

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Embodiment Construction

[0024] Hereinafter, the present invention will be described in detail.

[0025] The invention provides a stripping composition for color photoresists and organic insulating films. Based on the total weight of the stripping composition, the stripping composition includes: 1-10wt% quaternary ammonium compound; 40-80wt% pole Sexual solvent; 1~20wt% alkylamine; 1~10wt% by the amine compound shown in formula 1 or formula 2 below; 0.001~1wt% inorganic base or its salt; And, the water of 1~40wt% :

[0026] [Formula 1]

[0027]

[0028] Among them, R 1 is C 1 ~C 6 chain alkoxy or cyclic alkoxy, and the alkoxy can be C 1 ~C 6 The chain alkyl or cyclic alkyl is substituted or the alkoxy can be C 1 ~C 3 Alkoxy substitution, R 2 and R 3 each independently hydrogen or C 1 ~C 6 chain alkyl or cyclic alkyl, and n is an integer of 1 to 4,

[0029] [Formula 2]

[0030]

[0031] where A is O, S or N, and R 1 Yes: Hydrogen, unsubstituted C 1 ~C 20 Alkyl or C substituted by...

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Abstract

The invention discloses a stripping composition used for color photoresist and an organic insulating film. The stripping composition comprises a quaternary ammonium compound, polar solvent, alkylamine, a amine compound shown in the above formula 1 or the formula 2, inorganic alkali or salt thereof, and water.

Description

[0001] Cross References to Related Applications [0002] This application claims the benefit of two Korean patent applications KR10-2013-0060161 filed on May 28, 2013 and KR10-2013-0060162 filed on May 28, 2013, which are incorporated by reference Incorporated in this application in its entirety. technical field [0003] The present invention relates to a stripping composition for color photoresist and organic insulating film, which is used to reuse the color photoresist and organic insulating film by removing the cured color photoresist and organic insulating film from the color filter filter. Background technique [0004] A color filter is provided in a color photographing apparatus equipped with an image sensor such as a complementary metal oxide semiconductor (CMOS) or a charge coupled device (CCD), and can be used to obtain a color image. In addition, color filters are widely used in imaging devices, plasma display panels (PDPs), liquid crystal displays (LCDs), field ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/42
Inventor 房淳洪金佑逸尹嚆重洪宪杓
Owner DONGWOO FINE CHEM CO LTD
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