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Sputtering device

A technology of sputtering device and guide roller, applied in sputtering plating, ion implantation plating, coating and other directions, can solve the problem of preventing wrinkles from becoming creases and other problems that are not documented

Inactive Publication Date: 2015-01-21
NITTO DENKO CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, Patent Document 2 does not describe how to prevent wrinkles from becoming creases and how to prevent creases from occurring.

Method used

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Examples

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Embodiment Construction

[0029] figure 1 It is an overall perspective view of an example of the sputtering apparatus 10 of this invention. The sputtering apparatus 10 of the present invention includes a vacuum chamber 11 and a vacuum pump 12 for exhausting the vacuum chamber 11 . A supply roll 13 , a concave guide roll 14 , a film forming roll 15 , and a storage roll 16 are provided in the vacuum chamber 11 . The elongated film 17 is fed out from the supply roll 13 and guided by the concave guide roll 14 , wound around the film forming roll 15 for less than one turn, and then guided by the concave guide roll 14 again to be accommodated in the storage roll 16 .

[0030] The target material 18 faces the deposition roller 15 with a predetermined distance therebetween. The long film 17 advances continuously synchronously with the rotation of the film forming roller 15 . A thin film is attached to a position facing the target 18 on the long film 17 . exist figure 1 Although two targets 18 are shown ...

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Abstract

In a sputtering device of the present invention, a long film is guided by a plurality of concave guide rolls. Pressure imposed on the long film from the plurality of concave guide rolls is strong as near as an end and is weak as near as the center. Accordingly, the long film is substantially supported in an end portion of each of the concave guide rolls. Since wrinkles generated on the long film are not subjected to strong pressure from the concave guide rolls when passing through the concave guide rolls, these wrinkles do not turn to folds and pass through as they are.

Description

technical field [0001] The present invention relates to a sputtering device for forming a thin film on a long film. Background technique [0002] A sputtering method is widely used as a method of forming a thin film in a vacuum. In the sputtering method, plasma of the sputtering gas is generated by applying a voltage between the substrate and the target in a sputtering gas such as low-pressure argon gas with the substrate as the anode potential and the target as the cathode potential. The sputtering gas ions in the plasma collide with the target and bombard the constituent substances of the target. The bombarded constituent substances of the target are deposited on the substrate to form a thin film. [0003] As the transparent conductive film, a thin film of indium tin oxide (Indium-Tin-Oxide: ITO) is widely used. When forming an oxide thin film such as indium tin oxide (ITO), a reactive sputtering method is used. In the reactive sputtering method, a reactive gas such as...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C23C14/56
CPCH01J37/32733C23C14/34C23C14/562H01J37/3277H01J37/34
Inventor 梨木智刚滨田明
Owner NITTO DENKO CORP
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