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reverse conducting insulated gate bipolar transistor

A bipolar transistor, reverse conduction technology, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of high process control requirements, high manufacturing process control requirements, and difficult manufacturing.

Active Publication Date: 2019-03-22
CSMC TECH FAB2 CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The manufacturing method of the reverse conducting diode structure of the reverse conducting IGBT mainly adopts the method of digging and filling the back metal to form the reverse conducting diode structure, but the metal in the back groove of the reverse conducting IGBT is limited by the reverse conducting IGBT collector. Metal requirements, the parameters of the reverse conducting diode can only be adjusted by adjusting the width and depth of the trench, the process adjustment is troublesome, and the process control requirements are high
Therefore, from the above two process methods, it can be seen that the manufacturing method of the reverse conducting diode structure on the back of the common reverse conducting IGBT device requires high manufacturing process control and is difficult to manufacture.

Method used

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Examples

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Embodiment Construction

[0018] Please refer to figure 1 , one embodiment of the present invention provides a reverse conducting insulated gate bipolar transistor. The reverse conducting IGBT includes an N-type substrate 110 , a front structure formed on the front of the N-type substrate 110 and a back structure formed on the back of the N-type substrate 110 . Wherein, the front structure is the same as that of a common reverse conducting insulated gate bipolar transistor. The front structure includes a gate oxide layer 121 formed above the N-type substrate 110, a polysilicon gate electrode 122 formed above the gate oxide layer 121, a P well 123 formed next to the gate oxide layer 121, an N+ region 124 and a front P+ region 125 , the dielectric layer 126 formed on the polysilicon gate electrode 122 , the front metal layer 128 formed on the N+ region 124 and the dielectric layer 126 , and the passivation layer 129 formed on the front metal layer 128 . The back structure includes trenches 132 formed o...

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Abstract

The invention provides a reverse conducting insulated gate bipolar transistor. The reverse conducting insulated gate bipolar transistor comprises an N type substrate, a front-surface structure formed at the front surface of the N type substrate and a back-surface structure formed at the back surface of the N type substrate; the back-surface structure comprises grooves formed at the back surface of the N type substrate, back-surface P+ regions formed between the grooves, polysilicon arranged in the grooves and a back-surface metal layer which is formed on the back-surface P+ regions and the polysilicon. According to the reverse conducting insulated gate bipolar transistor, the polysilicon is adopted to fill the grooves at the back surface of the reverse conducting insulated gate bipolar transistor. When the reverse conducting insulated gate bipolar transistor is manufactured, it only needs to precisely control the doping concentration of the polysilicon so that the parameters of a reverse conducting diode at the back surface of the reverse conducting insulated gate bipolar transistor can be controlled, and process control requirements are low. The reverse conducting insulated gate bipolar transistor has the advantages of low manufacturing process control requirements and low manufacturing difficulty.

Description

technical field [0001] The invention relates to a semiconductor element, in particular to a reverse conducting insulated gate bipolar transistor. Background technique [0002] An insulated gate bipolar transistor (IGBT, Insulated Gate Bipolar Transistor) is a commonly used power switching device controlled by voltage. It has the characteristics of large input capacitance, high input impedance, small driving current, fast speed, high withstand voltage, strong thermal stability, high operating temperature, and simple control circuit. It has become the mainstream device of power electronic devices at this stage. The reverse conducting insulated gate bipolar transistor is a new type of IGBT device, which integrates the IGBT structure and the reverse conducting diode structure on the same chip. This can improve the passage of non-equilibrium carriers and optimize the tail current. Reverse conducting IGBT devices have many advantages such as small size, high power density, low c...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L29/739H01L29/06
CPCH01L29/6634H01L29/7396
Inventor 张硕芮强王根毅邓小社
Owner CSMC TECH FAB2 CO LTD
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