A wet etching device

A technology of wet etching and resistive pressure, which is applied in the direction of displaying liquid level indicators through pressure measurement, electrical components, semiconductor/solid-state device manufacturing, etc. It can solve the problems of inaccurate detection results, wrong liquid level signals, and easy sticking housing and other issues

Active Publication Date: 2018-01-26
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Not only that, but in practical applications, the etching liquid is a liquid with a relatively high viscosity, and the magnetic induction buoy sensor is easily stuck in the liquid with a relatively high viscosity, resulting in inaccurate detection results or sending out wrong liquids. bit signal

Method used

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  • A wet etching device
  • A wet etching device

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Embodiment 1

[0027] Such as figure 1 Shown is a schematic diagram of the composition framework of a wet etching device of the present invention. Such as figure 2 Shown is a schematic diagram of the workflow of a wet etching device of the present invention. from figure 1 As can be seen from the figure, a wet etching device of the present invention includes a chemical tank 1, a resistive pressure sensor 3, a chip 7, a single-chip microcomputer 8 and a display 9, wherein the chip 7 communicates with the The resistive pressure sensor 3 is connected, the chip 7 is connected to the single-chip microcomputer 8 by wires, the single-chip microcomputer 8 is connected to the display 9 by wires, and the resistive pressure sensor 3, the chip 7 and the single-chip microcomputer 8 are all connected to the power supply connect.

[0028] Below, each part of a kind of wet etching device of the present invention is introduced:

[0029] The chemical tank 1 of the present invention is used to contain a c...

Embodiment 2

[0038] This embodiment is substantially the same as Embodiment 1, except that the number of the resistive pressure sensors 3 in this embodiment is two. In order to obtain more accurate measurement results, in this embodiment, two resistive pressure sensors 3 are installed on the side of the bottom of the chemical tank 1, so that two sets of measurement data can be obtained, and if the difference between the two sets of data is small, it means that the measurement results are normal , and their average value can be taken as the measured value. If there is a big difference between the two sets of data, it means that at least one of the resistive pressure sensors 3 has a problem, and the resistive pressure sensor 3 must be inspected and repaired.

[0039] Another reason for installing two resistive pressure sensors 3 in the chemical tank 1 in this embodiment is that once one of the resistive pressure sensors 3 is broken, the other can continue to work normally, ensuring the conti...

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Abstract

The invention provides a wet etching device. The wet etching device comprises a chemical tank, a resistance type pressure sensor, a chip, a single-chip and a displayer, wherein the chip is connected with the resistance type pressure sensor through a wire; the chip is connected with the single-chip through the wire; the single-chip is connected with the displayer through the wire; the resistance type pressure sensor, the chip and the single-chip are connected with a power source. The wet etching device is not affected by viscidity of an etching solution and can monitor the liquid level of the etching solution exactly.

Description

【Technical field】 [0001] The invention relates to the technical field of liquid crystal display screens, in particular to a wet etching device. 【Background technique】 [0002] In the manufacturing process of liquid crystal display, the wet etching process is one of the more important etching processes. In the state of automatic operation of the wet etching equipment, it is necessary to monitor the liquid level of the etching liquid in the chemical bath in real time, so as to discharge or replenish the etching liquid as required. At present, in the field of wet etching technology, the method for monitoring the liquid level of the etching liquid is to complete the monitoring of the liquid level of the etching liquid through multiple sets of magnetic induction buoy sensors, wherein each set of magnetic induction buoy sensors The indicator corresponds to a group of liquid level indicators. Under normal circumstances, there are six groups of important liquid level indicators, f...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67G01F23/14
CPCG01F23/14H01L21/67075
Inventor 马迪
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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