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Evaporation equipment and evaporation method

An equipment and evaporation technology, applied in vacuum evaporation coating, sputtering coating, ion implantation coating and other directions, can solve the problems of evaporation source pollution and so on

Active Publication Date: 2018-06-08
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In order to solve the problem that the evaporation equipment in the related art needs to open the coating chamber when replacing the substrate after one coating is completed, at this time, the air will come into contact with the evaporation source and cause pollution to the evaporation source, the embodiment of the present invention provides a A kind of vapor deposition equipment and vapor deposition method

Method used

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  • Evaporation equipment and evaporation method
  • Evaporation equipment and evaporation method
  • Evaporation equipment and evaporation method

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Embodiment Construction

[0062] Reference will now be made in detail to the exemplary embodiments, examples of which are illustrated in the accompanying drawings. When the following description refers to the accompanying drawings, the same numerals in different drawings refer to the same or similar elements unless otherwise indicated. The implementations described in the following exemplary examples do not represent all implementations consistent with the present invention. Rather, they are merely examples of apparatuses and methods consistent with aspects of the invention as recited in the appended claims.

[0063] figure 1 It is a structural schematic diagram of an evaporation equipment provided by an embodiment of the present invention. The evaporation equipment can include:

[0064] The coating chamber 11 and at least one evaporation source chamber, the coating chamber 11 is provided with a substrate placement assembly 111, the substrate placement assembly 111 is used to place the substrate, an...

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Abstract

The invention relates to an evaporation equipment and an evaporation method, belonging to the technical field of film coating. The evaporation equipment includes: a coating chamber and at least one evaporation source chamber, a substrate placement assembly is arranged in the coating chamber, an evaporation source placement assembly is arranged in the first evaporation source chamber, and the evaporation source placement assembly is used to place the evaporation source , the first evaporation source chamber is any evaporation source chamber in at least one evaporation source chamber; a sealing assembly is arranged between the coating chamber and the first evaporation source chamber, and when the sealing assembly is opened, the coating chamber and the first evaporation source chamber The evaporation source chamber is connected, and when the sealing assembly is closed, the coating chamber and the first evaporation source chamber are isolated. The present invention provides at least one evaporation source chamber for placing the evaporation source, and the evaporation source chamber and the coating chamber can be connected or separated through the sealing assembly, so as to solve the problem of the air causing the evaporation source when the substrate is replaced. The problem of pollution; the effect of avoiding the evaporation source of air pollution is achieved.

Description

technical field [0001] The invention relates to the field of coating technology, in particular to an evaporation equipment and an evaporation method. Background technique [0002] Evaporation is the process of depositing and forming a film on the surface of a workpiece or substrate after evaporation or sublimation of the substance to be filmed. When performing evaporation, it is usually necessary to use evaporation equipment to create various environmental conditions required for evaporation. [0003] There is a kind of evaporation equipment in the related art, and this evaporation equipment comprises coating chamber, is provided with heating assembly, evaporation source (substance to be filmed) and substrate in this coating chamber, when using this evaporation equipment to carry out coating , place the evaporation source and the substrate in the coating chamber, then evacuate the coating chamber, and then heat the evaporation source through the heating element to coat the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/24
CPCC23C14/24C23C14/564C23C14/243C23C14/568
Inventor 张鑫狄孙俊民
Owner BOE TECH GRP CO LTD