Method and device used for preventing inner part of camera lens from atomization

A lens and various parts of the technology, applied in the field of preventing fogging inside the lens, can solve the problems of lens fogging, loss of production capacity, reduction of lamp life, etc., to achieve the effect of extending service life, reducing production costs, and improving transparency

Active Publication Date: 2016-01-06
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, since the TFTLCD factory environment usually contains organic matter (VOC) particles and ammonium positive ions (NH4 + ) particles, the environment where the exposure machine lens is stored requires a VOC concentration of less than 200ppb, and the VOC concentration of the G8. Particle accumulation is formed on the lens of the exposure machine, resulting in a decrease in glass transparency, that is, lens fogging occurs
On the one hand, the fogging of the lens of the exposure machine can lead to a reduction in the life of the light source and a loss of production capacity; on the other hand, it will greatly increase the replacement of the light source and the cost of cleaning and maintenance

Method used

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  • Method and device used for preventing inner part of camera lens from atomization
  • Method and device used for preventing inner part of camera lens from atomization
  • Method and device used for preventing inner part of camera lens from atomization

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Embodiment Construction

[0029] The present invention will be further described below in conjunction with the drawings.

[0030] The details introduced here are exemplary and are only used for illustrative discussion of the embodiments of the present invention. Their existence is to provide what is considered to be the most useful and understandable description of the principles and concepts of the present invention. Regarding this point, there is no attempt to introduce the structural details of the present invention beyond the level required for a basic understanding of the present invention. Those skilled in the art can clearly understand how to implement the present invention in practice through the description and drawings. Several forms.

[0031] figure 1 A flowchart of a method for preventing fogging inside the lens 10 according to the present invention is shown. Such as figure 1 As shown, the method includes the following steps:

[0032] Step S100: Determine the fogging position inside the lens 10;...

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Abstract

The invention discloses a method and a device used for preventing an inner part of a camera lens from atomization. The method comprises the following steps: determining an atomization position of the inner part of the camera lens; and introducing clean gas into the atomization position to remove impure gas at the atomization position of the camera lens. With the adoption of the method and device used for preventing the inner part of the camera lens from atomization, the transparency of the camera lens is effectively improved so that the camera lens does not need to be usually replaced, cleaned and maintained; and on the one hand, the productivity in a photoetching production process is improved, and on the other hand, the service life of the camera lens can be prolonged and the production cost is greatly reduced.

Description

Technical field [0001] The invention belongs to the technical field of liquid crystal display, and specifically relates to a method and a device for preventing fogging inside a lens. Background technique [0002] In recent years, small and medium-sized liquid crystal displays have developed rapidly. During the production of the array layer, multiple photolithography processes are required. The lens of the exposure machine is used to emit ultraviolet light. The ultraviolet light transmits the image information on the film or other transparent bodies. Transfer to the array substrate coated with photosensitive material to complete the multi-channel photolithography process of the array layer. [0003] However, because the TFTLCD factory environment usually contains organic matter (VOC) particles and ammonium cations (NH4 + ) Particles, the exposure machine lens storage environment requires VOC concentration to be less than 200ppb, and the VOC concentration of the G8.5 generation TFTLC...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 胡德莹
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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