A preparation method for forming a nanosheet structure network on a substrate and the substrate thereof
A structural network, nano-sheet technology, applied in metal material coating process, coating, gaseous chemical plating and other directions, can solve the problems of unfriendly environmental protection and complex manufacturing steps.
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[0045] According to the first embodiment of the present invention, the present invention provides a preparation method for forming a network of nanosheet structures on a substrate, the method comprising the following steps: providing a substrate and a silicon-containing compound; Cracking of the silicon-containing compound in a high-temperature furnace between 1500°C or in a quartz tube of a high-temperature furnace to form a gaseous composition; the hydrocarbon vapor is conveyed by means of argon into the above-mentioned high-temperature furnace or high-temperature furnace at a temperature between 500 and 1500°C In the quartz tube of the above-mentioned high-temperature furnace or the quartz tube of the high-temperature furnace at a temperature between 500 and 1500 ° C, The reactant forms a nano-sheet structure network on the substrate by means of a vapor phase deposition procedure, and there is a covalent bond between the nano-sheet structure network and the substrate.
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