Isothermal plasma CVD system for reduced taper in optical fiber preforms

A technology of optical fiber preform and plasma, which is applied in the field of chemical vapor deposition system, and can solve the problems such as infeasibility

Inactive Publication Date: 2016-02-03
OFS FITEL LLC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

State-of-the-art relative velocity methods are not feasible for these high-speed systems.

Method used

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  • Isothermal plasma CVD system for reduced taper in optical fiber preforms
  • Isothermal plasma CVD system for reduced taper in optical fiber preforms
  • Isothermal plasma CVD system for reduced taper in optical fiber preforms

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Embodiment Construction

[0018] As will be discussed in detail below, the present invention relates to an isothermal plasma CVD apparatus and related method of making optical fiber preforms that provide improved axial control of the cross-sectional area and refractive index profile of the preform. The apparatus and The method is based on the use of a low pressure (i.e., less than about 1 atmosphere) isothermal plasma CVD process that creates a hot zone of deposition that is narrowly confined to a region within the substrate tube immediately "upstream" of the isothermal plasma. The resulting narrow deposition zone The capability (which is typically less than 5% of the total length of the substrate tube) allows for continuous changes in deposition parameters and the ability to respond quickly and adjust the component flows as needed to maintain the desired shape of the axial refractive index profile. The ability to adjust reagent concentration as a function of elapsed process time and / or coil position (i...

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Abstract

The invention relates to an isothermal plasma CVD system for a reduced taper in optical fiber performs. Particularly a chemical vapor deposition (CVD) system is configured to reduce the presence of geometrical and optical taper at the end sections of the preform, or more generally controlling the axial profile of the fabricated optical fiber preform. The system is configured to create an isothermal plasma with an RF coil (22) within the substrate tube (12), with a relatively confined deposition zone (40) located upstream of the plasma. A reagent delivery system (50) is configured to adjust the composition and concentration of the introduced species in synchronization with the movement of the plasma and deposition zone within the substrate tube. By synchronizing the movement of the plasma with the adjustable reagent delivery system, it is possible to provide precision control of the axial profile of the created optical fiber preform.

Description

technical field [0001] The present invention relates to chemical vapor deposition (CVD) systems for producing optical fiber preforms, and more particularly, to an isothermal plasma CVD system that is specifically configured to reduce undesired axial non-uniformities (in Both geometry and composition) and in particular axial inhomogeneities that occur at the end portions of the preform substrate tube. Background of the invention [0002] Optical fiber preforms can be prepared by chemical vapor deposition (CVD) techniques, in which glass-forming chemicals are deposited on the interior of a silica-based tube in such a way that the interior of the tube is coated with a deposition material. During the CVD process, a vitreous glass or its soot precursor is deposited over a defined length of the substrate tube. In order to finally form an optical fiber with the desired optical properties, it is important that the layers deposited during CVD exhibit a uniform cross-sectional area a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03B37/018
CPCC03B37/01807C03B37/0183C03B2203/10C03B2207/70C03B2207/85
Inventor J·C·阿隆索D·D·布拉甘扎M·H·布罗德J·W·弗莱明
Owner OFS FITEL LLC
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