A kind of high-performance organosilicon-fluorine nano-coating and its application
A nano-coating and organosilicon technology, used in polyether coatings, anti-corrosion coatings, anti-fouling/underwater coatings, etc., can solve problems such as easy peeling, poor wear resistance and durability, and restricted use prospects.
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Embodiment 1
[0062] Perfluoropolyether siloxane resin F1, the molecular structure is as follows:
[0063]
[0064] Wherein m=10-50, n=5-100.
[0065] The synthesis method can be carried out according to the general perfluoropolyether compound and organosilicon compound hydrosilylation reaction conditions. The synthesis of fluorine-containing cage polysilsesquioxane (F-POSS) has the following molecular structure:
[0066]
[0067] Made of perfluorooctyltrimethoxysilane (C 8 f 17 CH 2 CH 2 Si(OCH 3 ) 3 , Perfluorooctyltriethoxysilane C 8 f 17 CH 2 CH 2 Si(OCH 2 CH 3 ) 3 The reaction is obtained, Rf represents -CH 2 CH 2 C 8 f 17 group.
[0068] The synthetic steps of F-POSS with reactive groups are specifically:
[0069] Add the purified perfluorooctyl polysilsesquioxane into a fluorine-containing solvent to dissolve, raise the temperature to 45°C, add an appropriate amount of acidic catalyst (trifluoromethanesulfonic acid, etc.), and stop the reaction after 60 minut...
Embodiment 2
[0075] Synthesis of perfluoropolyether siloxane resin F2, the molecular structure is as follows:
[0076]
[0077] Wherein R1 is methyl, ethyl; R2 is methyl; R3 is H; a=2 or 3.
[0078] Fluorine-containing cage polysilsesquioxane (F-POSS), the molecular structure is as follows:
[0079]
[0080] Made of perfluorohexyltrimethoxysilane (C 6 f 13 CH 2 CH 2 Si(OCH 3 ) 3 , Perfluorohexyltriethoxysilane C 6 f 13 CH 2 CH 2 Si(OCH 2 CH 3 ) 3 The reaction is obtained, R f for -CH 2 CH 2 C 6 f 13 .
[0081] The formula design of organic silicon fluorine nano coating is as follows:
[0082] substance
[0083] Wherein, solvent is identical with embodiment 1; Additive is identical with embodiment 1.
Embodiment 3
[0085] Synthesis of perfluoropolyether siloxane resin F3, the molecular structure is as follows:
[0086]
[0087] Where n=5-100.
[0088]Fluorine-containing cage polysilsesquioxane (F-POSS) with active reactive groups, the molecular structure is as follows:
[0089]
[0090] where R f for -CH 2 CH 2 C 6 f 13 or -CH 2 CH 2 C 8 f 17 ,T f It is a condensation group of trifluoromethanesulfonic acid.
[0091] The formula design of organic silicon fluorine nano coating is as follows:
[0092]
[0093]
[0094] Wherein, solvent is identical with embodiment 1; Additive is identical with embodiment 1.
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