A method for silicon powder doping
A technology of silicon powder and phosphorus powder, which is applied in the field of new energy nano-material preparation, can solve the problem of low conductivity of silicon materials, and achieve the effect of low conductivity and precise control of conductivity
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Embodiment 1
[0022] A silicon powder doping method described in this embodiment specifically includes the following steps.
[0023] (1) Use acetone, hydrofluoric acid, and ultrapure water to clean and dry the n-type silicon powder raw material with a conductivity of 1S / cm in sequence.
[0024] (2) Then place the cleaned silicon powder and phosphorus powder in a tube furnace for zone heating, using argon as a protective atmosphere, the temperature at the silicon powder is 800°C, the temperature at the phosphorus powder is 300°C, and the heat treatment time is 30min .
[0025] (3) Finally, the heat-treated silicon powder is cleaned and dried with hydrofluoric acid and ultrapure water in sequence.
[0026] Using this method can obtain a conductivity of 8×10 3 S / cm n-type silicon powder.
Embodiment 2
[0028] A silicon powder doping method described in this embodiment specifically includes the following steps.
[0029] (1) Use acetone, hydrofluoric acid, and ultrapure water to clean and dry the p-type silicon powder raw material with a conductivity of 1S / cm in sequence.
[0030] (2) Then put the cleaned silicon powder and phosphorus powder in a tube furnace for zone heating, using argon as the protective atmosphere, the temperature at the silicon powder is 820°C, the temperature at the phosphorus powder is 300°C, and the heat treatment time is 30min .
[0031] (3) Finally, the heat-treated silicon powder is cleaned and dried with hydrofluoric acid and ultrapure water in sequence.
[0032] Using this method can obtain a conductivity of 4×10 3 S / cm n-type silicon powder.
Embodiment 3
[0034] A silicon powder doping method described in this embodiment specifically includes the following steps.
[0035] (1) Use acetone, hydrofluoric acid, and ultrapure water to clean and dry the n-type silicon powder raw material with a conductivity of 1S / cm in sequence.
[0036] (2) Then mix the cleaned silicon powder and phosphorus powder and place them in a tube furnace for heating, using argon as the protective atmosphere, the treatment temperature is 760°C, and the heat treatment time is 60 minutes.
[0037] (3) Finally, the heat-treated silicon powder is cleaned and dried with hydrofluoric acid and ultrapure water in sequence.
[0038] Using this method can obtain a conductivity of 2×10 3 S / cm n-type silicon powder.
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Abstract
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