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Bacterium with increased tolerance to butyric acids

A technology for bacteria, tolerance, applied in the direction of bacteria, methods using microorganisms, methods based on microorganisms, etc.

Inactive Publication Date: 2016-09-14
LANZATECH NEW ZEALAND LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the growth of many microorganisms is affected by even very low concentrations of butyrate, which prevents the production of butyrate in economically viable quantities

Method used

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  • Bacterium with increased tolerance to butyric acids
  • Bacterium with increased tolerance to butyric acids
  • Bacterium with increased tolerance to butyric acids

Examples

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example

[0052] The following examples further illustrate the invention but, of course, should not be construed as in any way limiting its scope.

example 1

[0054] This example demonstrates the typical growth of Clostridium strains.

[0055] Clostridium strains were grown at 37°C in PETC medium, pH 5.6, using standard anaerobic techniques (Hungate, Meth Microbiol, 3B:117-132, 1969; Wolfe, Microbial Physiology Advances (Adv Microb Physiol), 6:107-146, 1971). Fructose (heterotrophic growth) or 30 psi CO-containing steel plant gas (collected on-site at New Zealand Steel in Glenbrook, NZ) in the headspace; composition: 44% CO, 32% N 2 , 22%CO 2 , 2%H 2 ) (autotrophic growth) as a substrate. For solid media, 1.2% Bacterial Agar (BD, Frankton Lakes, NJ 07417, USA) was added.

[0056]

[0057]

example 2

[0059] This example demonstrates the toxicity of 2-HIBA to Clostridium autoethanogenum LZ1561 in serum bottles and continuous stirred tank reactors (CSTR).

[0060] serum bottle

[0061] Two sets of serum bottle experiments were performed with media containing 0, 0.5, 1, 1.5, 2, 3 or 4 g / L 2-HIBA. The average of optical density (OD) data from two sets of growth experiments is plotted. Data points outside the intuitively observed exponential growth phase were removed and the growth rate (μ) for each concentration of 2-HIBA was calculated by fitting an exponential trend line (Figure 1).

[0062] Figure 1 shows the growth rate of C. autoethanogenum challenged with different concentrations of 2-HIBA. Figure 1A and Figure 1B Individual differences in the growth curves of the two groups of growth experiments (n=3) are shown. Figure 1C and Figure 1D respectively show the corresponding Figure 1A and Figure 1B The exponential fitting line of . Figure 1C Further display o...

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Abstract

The invention provides a bacterium with an increased tolerance to butyric acids, such as 2-hydroxybutyric acid (2-HIBA). In particular, the invention provides a bacterium that tolerates at least 2.5 g / L of butyric acid. The bacterium may be derived, for example, from genus Clostridium, Moorella, Oxobacter, Peptostreptococcus, Acetobacterium, Eubacterium, or Butyribacterium.

Description

[0001] Cross References to Related Applications [0002] This application claims the benefit of U.S. Provisional Patent Application No. 61 / 932,699, filed January 28, 2014, which is incorporated herein by reference in its entirety. [0003] sequence listing [0004] This application includes a nucleotide / amino acid sequence listing filed concurrently with it and identified as follows: ASCII (text) file of 247,546 bytes named "LT100WO1.txt", created on January 28, 2015, the entire contents of which are Incorporated herein by reference. Background technique [0005] Butyric acid is used in various industries. For example, butyric acid can be used to make biofuels that offer greater sustainability, reduced greenhouse gas emissions, and security of supply compared to petroleum-based fuels. Additionally, butyric acid can be used in the pharmaceutical industry, especially in prodrug formulations, and in the chemical industry for the manufacture of products such as cellulose ace...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C12N1/20C12P7/00
CPCC12P7/065C12P7/54C12N1/36C12N1/20C12P7/18Y02E50/10C12R2001/145C12N1/205
Inventor B·D·黑斯特拉B·艾尔-辛那维L·B·史密斯R·O·延森W·P·米歇尔M·科普克
Owner LANZATECH NEW ZEALAND LTD
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