A processing method and device for process parameters

A technology of process parameters and processing methods, applied in the direction of digital control, electrical program control, etc., can solve the problems of high requirements for implementers, low modification efficiency, and heavy workload, so as to reduce risks, reduce operations, and improve processing efficiency. Effect

Active Publication Date: 2019-02-19
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] However, as the process becomes more and more complex, a recipe contains more and more information, and the parameters of the recipe template change will gradually increase, and the change of the recipe template will cause the previous recipes to be re-modified or re-edited; , when the number of recipes is large, modify the configuration files of each recipe one by one, the workload is large, making the modification efficiency low. In addition, because the modification of the recipe requires strong professional and technical knowledge, the modification process There are also relatively high requirements for implementers

Method used

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  • A processing method and device for process parameters
  • A processing method and device for process parameters
  • A processing method and device for process parameters

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Embodiment 1

[0046] refer to figure 1 , which shows a flow chart of the steps of Embodiment 1 of a process parameter processing method of the present invention, which may specifically include:

[0047] Step 101, when it is detected that the first configuration file of the recipe template has changed, according to the second configuration file identifier of the existing recipe recorded in the first configuration file, search for the second configuration file of the existing recipe;

[0048]At present, in the field of semiconductor integrated circuits, due to the higher and higher processing precision, the process has become more and more complex, and a recipe contains more and more information, and the recipe parameters that need to be modified and added will continue to increase. After modifying the first configuration file of the recipe template, it is necessary to modify the second configuration files of all existing recipes corresponding to the recipe template. Specifically, a recipe t...

Embodiment 2

[0095] refer to figure 2 , which shows a flow chart of steps in Embodiment 2 of a process parameter processing method of the present invention, which may specifically include:

[0096] Step 201, when it is detected that the first configuration file of the recipe template has changed, according to the first configuration file, obtain the first parameter list of the recipe template;

[0097] Specifically, the RecipeExecutor node in the first configuration file corresponding to the recipe template is stored in the first container L1 in units of Param, that is, all the first parameter information in the first parameter list is stored in L1 in order, and the Specifically, the first container L1 may be a list List. In practical applications, other storage structures may be used besides the List, and the present invention does not limit the storage structure.

[0098] Step 202, according to the second configuration file identifier of the existing Recipe recorded in the first confi...

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Abstract

The invention provides a technological parameter processing method and device. The method comprises that when it is detected that a first configuration file of a Recipe template is changed, a second configuration file of a known Recipe corresponding to the Recipe template is searched and obtained according to an identification of the second configuration file of the known Recipe recorded in the first configuration file; and the second configuration rile is compared with the first configuration file and modified. The Recipe parameter processing efficiency can be improved.

Description

technical field [0001] The invention relates to the field of semiconductor integrated circuits, in particular to a method and device for processing process parameters. Background technique [0002] Recipe (process method) refers to the process in the industrial automation manufacturing process. The recipe can include the following information: multiple steps in the material processing process, the values ​​of various process parameters in each step, and the end conditions of each step, etc. Wait. [0003] In practical applications, recipes can be generated through recipe templates. However, in the field of semiconductor integrated circuits, due to the higher processing precision and the more complex manufacturing process, a recipe contains more and more information, so it is necessary to modify the recipe template, such as Modify or add parameters in the template. After modifying the recipe template, the recipe generated according to the recipe template before modificatio...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G05B19/19
CPCG05B19/19
Inventor 蔡纯兴
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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