Low-cost method for preparing aerogel by means of atmospheric pressure drying
A technology of normal pressure drying and airgel, applied in chemical instruments and methods, silica, inorganic chemistry, etc., can solve the problems of high cost of solvent replacement and easy pollution, and achieve the effect of improving surface tension and reducing costs
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Embodiment 1
[0030] (1) Add a certain amount of acid to sodium silicate to adjust the pH, so that the solution is acidic and hydrolyzed to form a silica wet gel;
[0031] (2) Add alkali catalyst urea to the silica wet gel obtained in step (1), place it in a water bath at 30-50°C, let it stand for aging, and form silica gel; the amount of urea added is wet 1% of gel mass;
[0032] (3) Wash the silica gel obtained in step (2) with deionized water several times to remove acid, alkali and impurity ions in the gel;
[0033] (4) Drain the silica gel obtained in step (3) naturally until no more water drips, then immerse in a low-concentration solution prepared by the surfactant tetradecyltrimethylammonium chloride, soak for more than 24 hours, and naturally Drain;
[0034] (5) Place the naturally drained silica gel in step (4) in a drying oven equipped with ultrasonic waves. The silica gel is placed on the overhead layer. The lower part is a carbon dioxide gas heat source at a temperature of 90...
Embodiment 2
[0037] (1) Add a certain amount of acid to the water glass to adjust the pH, so that the solution is acidic and hydrolyzed to form a silica wet gel;
[0038] (2) Add alkali catalyst ammonia water to the silica wet gel obtained in step (1), place it in a water bath at 30-50°C, let it stand for aging, and form silica gel;
[0039] (3) Wash the silica gel obtained in step (2) with deionized water several times to remove acid, alkali and impurity ions in the gel;
[0040] (4) Drain the silica gel obtained by cleaning in step (3) naturally until no more water drips, then immerse in a low-concentration solution prepared by a surfactant, soak for more than 24 hours, and drain naturally;
[0041](5) Place the silica gel drained naturally in step (4) in a drying oven equipped with ultrasonic waves. The silica gel is placed on the overhead layer. The lower part is a 60°C nitrogen heat source, and the upper part is an outlet for volatile matter. Ultrasonic waves are generated by two ult...
Embodiment 3
[0044] (1) Add a certain amount of acid to adjust the pH of tetraethyl orthosilicate, so that the solution is acidic and hydrolyzed to form a silica wet gel;
[0045] (2) Add alkali catalyst sodium hydroxide to the silica wet gel obtained in step (1), place it in a water bath at 30-50°C, let it stand, and age to form silica gel;
[0046] (3) Wash the silica gel obtained in step (2) with deionized water several times to remove acid, alkali and impurity ions in the gel;
[0047] (4) Drain the silica gel obtained by cleaning in step (3) naturally until no more water drips, then immerse in a low-concentration solution prepared by a surfactant, soak for more than 24 hours, and drain naturally;
[0048] (5) Place the silica gel drained naturally in step (4) in a drying oven equipped with ultrasonic waves. The silica gel is placed in the overhead layer, the lower part is a stable gas heat source, and the upper part is the volatile matter outlet. Ultrasonic waves are generated by 5 u...
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