Manufacturing method of plasma display screen up and down base plate component element

Abstract

This invention put forward a method for processing high and low baseplate on PDP which is to perform surface modification to PDP baseplate glass, by controlling the extension of slurry on the baseplate glass to meet the needs of processing different components of PDP then to produce electrodes, baffles and dielectric layer by silk net printing method with low line-cut rate, high accuracy and smooth surface of dielectric layer and uniform thickness. Since the processed baseplate glass is durable to be washed, it can be stored in a period of time to simplify the process and increase productive efficiency.

Description

1. Technical field

[0001] The invention relates to the manufacture of flat panel displays, and relates to a method for manufacturing upper and lower substrate components of a plasma display screen (PDP), such as making electrodes, barriers and media. 2. Background technology

[0002] According to the search data of the applicant, the technical data related or close to the present invention are as follows:

[0003] 1. A known method for making electrode components of plasma display screens is the method of thin film photolithography, that is, a layer of metal film is evaporated on the entire substrate surface, and then patterns (electrodes) are formed by photolithography, (French Patent N2169912 HOIJ9 / 00 Op.01.02.1973). The disadvantages of this method are high cost, long production cycle and low yield.

[0004] 2. Using the combination of thin film technology and thick film technology, apply photosensitive resin on the clean substrate, expose and develop, leave the groove ...

Examples

Embodiment 1

[0030] Prepare a 1% aqueous solution of vinyltriethoxysilane, add an equal amount of isopropanol and acetic acid, put the plasma display (PDP) substrate glass that has been strictly cleaned and annealed into the solution and soak for about 1h (the volume of the solution) Put the container in a constant temperature box at 100°C), take it out, rinse it with pure water, dry it for ten minutes, use the method of screen printing to make electrodes on the treated glass surface, dry it for ten minutes, then perform high temperature heat treatment, and finally Compared with the width of the silver electrode on the obtained upper substrate and the width of the silver electrode on the substrate without soaking treatment, the line width improvement rate reaches 33%.

Embodiment 2

[0032] Prepare a 1% vinyltriethoxysilane ethanol solution, soak the plasma display (PDP) substrate glass that has been strictly cleaned and annealed (at room temperature), and make electrodes by screen printing for about 23 hours. After drying for more than ten minutes, high-temperature heat treatment is finally performed, and the improvement rate of electrode line width reaches 20%.

Embodiment 3

[0034] Soak the plasma display (PDP) substrate glass with a vinyltriethoxysilane solution with a concentration of 99.8% for a while, take it out and dry it, and then use a screen printing paste with striped graphics. It can be clearly seen that the paste is The surface of the substrate is quickly spread out and leveled, and after drying, a dielectric layer with a smooth surface and uniform thickness is obtained.

1. Technical field

[0001] The invention relates to the manufacture of flat panel displays, and relates to a method for manufacturing upper and lower substrate components of a plasma display screen (PDP), such as making electrodes, barriers and media. 2. Background technology

[0002] According to the search data of the applicant, the technical data related or close to the present invention are as follows:

[0003] 1. A known method for making electrode components of plasma display screens is the method of thin film photolithography, that is, a layer of metal film is evaporated on the entire substrate surface, and then patterns (electrodes) are formed by photolithography, (French Patent N2169912 HOIJ9 / 00 Op.01.02.1973). The disadvantages of this method are high cost, long production cycle and low yield.

[0004] 2. Using the combination of thin film technology and thick film technology, apply photosensitive resin on the clean substrate, expose and develop, leave the groove ...

Examples

Embodiment 1

[0030] Prepare a 1% aqueous solution of vinyltriethoxysilane, add an equal amount of isopropanol and acetic acid, put the plasma display (PDP) substrate glass that has been strictly cleaned and annealed into the solution and soak for about 1h (the volume of the solution) Put the container in a constant temperature box at 100°C), take it out, rinse it with pure water, dry it for ten minutes, use the method of screen printing to make electrodes on the treated glass surface, dry it for ten minutes, then perform high temperature heat treatment, and finally Compared with the width of the silver electrode on the obtained upper substrate and the width of the silver electrode on the substrate without soaking treatment, the line width improvement rate reaches 33%.

Embodiment 2

[0032] Prepare a 1% vinyltriethoxysilane ethanol solution, soak the plasma display (PDP) substrate glass that has been strictly cleaned and annealed (at room temperature), and make electrodes by screen printing for about 23 hours. After drying for more than ten minutes, high-temperature heat treatment is finally performed, and the improvement rate of electrode line width reaches 20%.

Embodiment 3

[0034] Soak the plasma display (PDP) substrate glass with a vinyltriethoxysilane solution with a concentration of 99.8% for a while, take it out and dry it, and then use a screen printing paste with striped graphics. It can be clearly seen that the paste is The surface of the substrate is quickly spread out and leveled, and after drying, a dielectric layer with a smooth surface and uniform thickness is obtained.