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Process control method and system, semiconductor equipment

A process control and semiconductor technology, applied in the direction of comprehensive factory control, comprehensive factory control, semiconductor/solid-state device manufacturing, etc., can solve the problems of low maintenance efficiency, low control execution efficiency, easy loss of information, etc., to achieve effective maintenance and reduce information loss. Lost, Possibility-Reducing Effects

Active Publication Date: 2020-02-14
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In practical application, there are the following problems in adopting the above-mentioned process control method: first, the sub-recipe and the parent formula need to be maintained and managed separately, which will cause easy loss of information and low maintenance efficiency; Requires interactive parent recipes, resulting in inefficient control execution

Method used

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  • Process control method and system, semiconductor equipment
  • Process control method and system, semiconductor equipment
  • Process control method and system, semiconductor equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] figure 1 For the flow chart of the process control method provided by the embodiment of the present invention, please refer to figure 1 , specifically, the process includes a parent process and a child process, and the parent recipe and the child recipe corresponding to the parent process and the child process are stored in the lower computer.

[0024] The process control method comprises the following steps:

[0025] S1. The lower computer parses the parent formula according to the instruction sent by the upper computer to obtain the sequence of parent execution steps and the identification and number of cycles of the sub-process corresponding to each parent execution step, wherein the number of cycles ≥ 1.

[0026] In this example, the table below is the parent recipe.

[0027]

[0028]

[0029] There are three parent execution steps, which are step 1, step 2, and step 3. The sequence of the corresponding parent execution steps is defined as Step, and the valu...

Embodiment 2

[0059] image 3 The functional block diagram of the process control system provided by the embodiment of the present invention. see image 3 , the process control system provided in this embodiment is applied to the lower computer, and the process control system includes:

[0060] The storage module 10 is used to store the parent recipe and child recipe corresponding to the parent process and child process of the process.

[0061] The parsing module 11 is configured to parse the parent recipe according to the instruction sent by the host computer, so as to obtain the sequence of parent execution steps and the identification and cycle times of the sub-processes corresponding to each parent execution step.

[0062] The executing module 12 is configured to execute the following steps one by one according to the sequence of parent execution steps: read the corresponding sub-recipe according to the obtained identifier, and execute the sub-recipe according to the obtained cycle ti...

Embodiment 3

[0070] The embodiment of the present invention also provides a semiconductor device, including a process control system, and the process control system adopts the process control system provided in Embodiment 2 of the present invention.

[0071] Specifically, semiconductor processing equipment includes etching equipment. More specifically, the etching equipment includes inductively coupled plasma etching equipment.

[0072] The semiconductor equipment provided by the embodiment of the present invention adopts the process control system provided by the embodiment of the present invention, which can improve control execution efficiency and maintenance efficiency.

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Abstract

The invention provides a process control method and system. The process includes a parent process and sub processes. A parent formula and sub formulas corresponding to the parent process and the sub processes are both stored in a lower computer. The process control method includes steps of S1, the lower computer analyzes the parent formula according to a command sent by an upper computer so as to obtain a parent execution step sequence and marks and cycle times of the sub processes corresponding to each parent execution step; S2, the lower computer performs the follow steps, including reading the corresponding sub formulas according to the obtained marks and performing the sub formulas according to the obtained cycle times, successively according to the parent execution step sequence. According to the invention, the sub formulas and the parent formula are maintained more conveniently and effectively, so that information loss possibility is reduced. Besides, the execution of cycle techniques is more effectively, so that execution and maintenance efficiency is improved.

Description

technical field [0001] The invention belongs to the technical field of semiconductor processing, and in particular relates to a process control method and system, and semiconductor equipment. Background technique [0002] The Bosch process is an ICP etching process technology proposed by Robert Bosch in 1993. The entire etching process is repeated multiple times in a cycle unit. The cycle unit includes two steps: an etching step and a deposition step, that is, the entire etching process is Alternating cycles of etching steps and deposition steps. [0003] In order to realize the control of the above-mentioned Bosch process, the following control methods are adopted in the prior art: the above-mentioned cycle unit is used as a sub-process, and the sub-recipe (ie, sub-recipe) corresponding to the sub-process is stored in the lower computer, and the lower computer directly controls the equipment to obtain The computer of the equipment status is generally PLC / single-chip microc...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G05B19/418H01L21/67H01L21/3065
CPCG05B19/418H01L21/3065H01L21/67011Y02P90/02
Inventor 李娟娟
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD