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Vacuum coating equipment and coating method of single substance thin film

A vacuum coating and equipment technology, applied in the field of materials, can solve problems such as film failure, achieve the effect of avoiding atmospheric contact and ensuring performance

Active Publication Date: 2020-06-12
ZHANGJIAGANG KANGDE XIN OPTRONICS MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of this application is to provide a vacuum coating device and a coating method for a simple film to solve the problem of film failure caused by the contact between the simple film and the outside world in the prior art

Method used

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  • Vacuum coating equipment and coating method of single substance thin film
  • Vacuum coating equipment and coating method of single substance thin film
  • Vacuum coating equipment and coating method of single substance thin film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0052] use image 3 The vacuum coating equipment shown in the figure goes into the coating of thin films, and the specific coating process is as follows:

[0053] First, place four substrates (not shown in the figure) on the four first through holes of the stage 1 of the vacuum coating equipment, and the positions of the substrates correspond to the positions of the masks 2 one by one. Then, each mask 2 is turned under each substrate, and the plated target area of ​​the substrate is exposed due to the existence of the second through hole.

[0054] Secondly, the Ca simple substance film is plated, and the Ca simple substance film 100 is formed in the plating target area of ​​the substrate corresponding to the second through hole of the mask, as Figure 4 shown.

[0055] Again, move the mask 2 so that the mask 2 does not block the substrate at all.

[0056] Finally, SiO is plated on the surface of the substrate 2 The protective film 200 forms the final film, which is called ...

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Abstract

The invention provides vacuum film-coating equipment and a coating method for an elementary-substance film. The vacuum film-coating equipment comprises a carrying table used for placing a substrate, and at least one mask, wherein each mask is arranged on the surface for placing the substrate, of the carrying table, during coating working; and the mask is used for masking a non-coating target area of the substrate and exposing a coating target area of the substrate. Through applying the vacuum film-coating equipment, a protection film having a surface area larger than the surface area of the elementary-substance film can be formed on the surface of the elementary-substance film, and then atmosphere can be prevented from entering the elementary-substance film, and the failure of the elementary-substance film is avoided.

Description

technical field [0001] The present application relates to the field of material technology, in particular, to a vacuum coating device and a method for coating a simple thin film. Background technique [0002] Active elemental films, especially active metal elemental films, such as Ca elemental films, Al elemental films, etc., are prone to chemical reactions after contact with gases in the air, and other compounds are formed on the surface of the elemental film, making the elemental film There are impurities, thereby affecting its performance. [0003] In order to avoid the chemical reaction between the prepared elemental film and the gas in the atmosphere, it is usually placed in an inert gas atmosphere to avoid contact between the elemental film and the gas in the atmosphere. During the process, there will still be contact with the atmosphere and chemical reactions will occur, and there will be compounds on the surface of the elemental film, which will cause the failure of...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/04C23C14/14C23C14/22
CPCC23C14/042C23C14/14C23C14/22
Inventor 于甄解金库高建聪
Owner ZHANGJIAGANG KANGDE XIN OPTRONICS MATERIAL