Lithography machine illumination uniformity correction device and correction method

Abstract

The invention relates to a lighting uniformity correction device and correction method of a photoetching machine. The correction device comprises a base, an upper correction module and a lower correction module, wherein the upper correction module and the lower correction module are arranged at two sides of an illumination light field in a scanning direction and are symmetrically arranged relative to a non-scanning direction of the illumination light field, and both of the upper correction module and the lower correction module are provided with a flexible thin plate, corresponding deflection deformation is obtained by controlling displacement of different points on a cross section of the flexible thin film, a part of illumination light is shielded by the flexible thin plate which moves along the scanning direction of the illumination light field to enter the illumination light field, so that the purpose of correcting the lighting uniformity is achieved. Since the profile of the flexible thin plate after deflection deformation is a continuous curve, the device has higher correction capability and correction resolution.

Description

technical field [0001] The invention relates to an illumination system of a lithography machine, in particular to an illumination uniformity correction device and a correction method for the illumination system of a lithography machine. Background technique [0002] In the lithography machine, the function of the illumination system is to adjust the beam emitted by the laser to provide a high-quality illumination field for the mask, so as to ensure the high-quality imaging of the mask pattern on the silicon wafer through the projection objective lens. A uniform illumination field can reduce the lithography process factor and improve the resolution of the entire lithography system. However, with the continuous development of lithography technology and the continuous reduction of feature size, the uniformity requirements of lithography for the illumination system are also increasing. For example, the uniformity of the illumination system in a 90nm lithography machine is requir...

AI Technical Summary

Problems solved by technology

[0005] The prior art [5] (US7864297B2) describes a uniformity correction device for a flexible finger array. In this device, each correction unit can not only run in a straight line along the Y (scanning direction), but the flexible parts can also make the correction unit Rotate around the Z axis, the correction resolution is improved, but the movement of the correction unit in the Y direction is coupled with the rotation in the Z direction, thus increasing the complexity of the finger positioning algorithm

And the curve formed by the top of the correction unit in this device is still discontinuous, so there is still room for improvement in the correction resolution

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