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91results about How to "Adjust Uniformity" patented technology

Plasma enhanced chemical vapor deposition equipment

The invention discloses plasma enhanced chemical vapor deposition (PECVD) equipment, and belongs to the technical field of vapor deposition. The equipment can guarantee the gas uniformity when the flow and pressure of process gas change greatly under a condition that the flow modulating mechanism is not modified. The equipment comprises an upper electrode plate, a lower electrode plate, a radio-frequency cover, and a diffusion plate; the upper electrode plate is communicated with the radio-frequency power supply through the radio-frequency cover, and the lower electrode plate is grounded; the radio-frequency plate is provided with a gas inlet pipe and forms a flow modulating cavity with the upper electrode plate; the upper electrode plate is provided with a plurality of through holes, a reaction cavity is arranged under the upper electrode plate, and the lower electrode plate is arranged in the reaction cavity; the PEVCD equipment also comprises a driving device; the diffusion plate is arranged under the gas inlet pipe and is connected to the driving device, and the driving device drives the diffusion plate to move up and down relative to the radio-frequency cover. The PECVD equipment can be applied to fields of photovoltage, thin-film transistor, and the like.
Owner:BEIJING NAURA MICROELECTRONICS EQUIP CO LTD

Plasma processing device and processing method thereof

The invention relates to a plasma processing device, which comprises a vacuum processing cavity, an upper electrode and a lower electrode, a first radio frequency power source and an AC power source, wherein the vacuum processing cavity induces reaction gas; the upper electrode and the lower electrode are oppositely arranged at the inner side of the processing cavity; the lower electrode is provided with a base plate to be processed; the first radio frequency power source is connected with the lower electrode, is provided with a first frequency, and is used for forming the plasma of the reaction gas between the upper electrode and the lower electrode; the upper electrode comprises a plurality of subareas which are mutually and electrically insulated from each other; the AC power source is connected with at least one of the subareas on the upper electrode and is provided with a second frequency, wherein the second frequency is smaller than the first frequency. As the upper electrode is provided with a plurality of electrically-insulated subareas, the AC power source with changeable powder is applied onto some subareas, and a sheath layer, the depth of which is in proportion to the power, is formed under the upper electrode, the plasma processing device leads the more plasma to flow into the position of the thinner plasma sheath layer and increases the plasma density at the position, thereby being capable of stably adjusting the homogenization of the plasma in the processing cavity.
Owner:ADVANCED MICRO FAB EQUIP INC CHINA

Aluminum profile machining surface polishing device capable of adjusting polishing uniformity

The invention discloses an aluminum profile machining surface polishing device capable of adjusting the polishing uniformity, which comprises a base, a positioning frame is fixedly arranged in the middle of the top of the base, through grooves are arranged at the middles of the two sides of the inner wall of the positioning frame, sliding blocks are arranged in the two through grooves in a sliding mode, a fixed plate is fixedly arranged at one end of the two sliding blocks, and one end of each of the two sliding blocks is fixedly connected with the middle position of the two sides of the fixed plate correspondingly. A positioning handle is rotated, so that a moving block arranged on the outer wall of a lead screw in a threaded mode drives a second rotating disc at the bottom end to move, the second rotating disc slides along a first sliding groove on the inner wall of a positioning seat fixed to the bottom end of a first rotating disc through a moving block fixed to the top end, the second rotating disc can be adjusted to different rotating polishing areas, and therefore the surface polishing and grinding uniformity of an aluminum profile is adjusted, and aluminum profiles with different specification requirements can be ground conveniently, and the practicability of the aluminum profile surface machining, polishing and grinding device is improved.
Owner:江苏万和铝业有限公司

Electric adjustable coating baffle device and coating equipment

ActiveCN106399964ASolve technical problems with limited adjustment rangeControl UniformityVacuum evaporation coatingSputtering coatingBiochemical engineeringLarge range
The invention relates to the technical field of automatic equipment, and particularly relates to an electric adjustable coating baffle device and coating equipment. The electric adjustable coating baffle device disclosed by the invention is applied to the coating equipment. The coating equipment comprises a target material and a substrate which are arranged in a spaced manner; the electric adjustable coating baffle device comprises a base plate, a baffle component and an adjusting mechanism, wherein the baffle component is arranged above the base plate; and the adjusting mechanism is arranged above the base plate, is connected with the baffle component and is used for controlling the baffle component to move so that the baffle component can extend out of the base plate and reach a place between the target material and the substrate. In a vacuum coating process, when a non-uniform region is detected in a membrane layer on the substrate, the adjusting mechanism is used for controlling the baffle component to extend out of the base plate and reach the place between the target material and the substrate, so that the baffle component can obstruct the substrate in a region in which the membrane layer is relatively thick, and thus the uniformity of the membrane layer in the region can be controlled. The electric adjustable coating baffle device disclosed by the invention can be used for implementing large-range adjustment of the uniformity of the membrane layer on the substrate in a vacuum state, so time and cost are effectively saved.
Owner:XINYI GLASS (TIANJIN) CO LTD

Photoetching machine lighting system and method with pupil plane quality monitoring and calibrating functions

The invention provides a photoetching machine lighting system and a photoetching machine lighting method with pupil plane quality monitoring and calibrating functions. The method comprises the following steps: emitting laser generated by a laser generator onto a first reflecting mirror so as to reflect the laser to a miniature reflecting mirror array; operating the reflecting mirror array, and adjusting a specific inclination angle of each miniature reflecting mirror unit to enable incident laser to pass through the reflecting mirror array to form a pupil plane shape; projecting a first part of the laser onto a pupil plane quality monitoring element through a light splitting component, acquiring complete pupil plane information through a light intensity value, and judging whether the reflecting mirror array needs to be adjusted; if it is determined that the reflecting mirror array does not need to be adjusted, reflecting a second part of the laser by a second reflecting mirror to enable the laser to enter a subsequent light path for subsequent adjustment; if it is determined that the reflecting mirror array needs to be adjusted, computing pupil plane quality information to obtain a needed adjustment angle of each miniature reflecting mirror unit in the reflecting mirror array, then feeding back to the reflecting mirror array, and performing angle adjustment by the reflecting mirror array according to the needed adjustment angle to calibrate a pupil plane.
Owner:SHANGHAI HUALI MICROELECTRONICS CORP

Gas baking method and device for aluminium electrolysis cell

The invention discloses a gas baking method and device for an aluminium electrolysis cell. The method comprises the following steps of: heating a cell cavity to 900 DEG C, and directly pouring electrolyte into the cell cavity for starting; in the heating process of the cell cavity, dividing the cell cavity of the electrolysis cell into a plurality of areas, respectively arranging controlled burners at multiple spots of each area, wherein the controlled burners are uniformly distributed and are arranged under the bottom palm of the positive pole of the big surface of the aluminium electrolysis cell in a staggering mode, and controlled draught flues are respectively arranged in the central joint of the cell cavity and at multiple spots of the side surface of the cell cavity so as to reduce the temperature difference between all the areas; and in the baking process, controlling the ratio of the gas to the air to be less than 1:3, and preventing carbon blocks from oxidizing in a controlled oxygen deprivation combustion mode. The device comprises the plurality of controlled special-shaped burners and the controlled draught flues, wherein the controlled special-shaped burners are uniformly distributed and are arranged under the bottom palm of the positive pole of the big surface of the electrolysis cell in a staggering mode, and the controlled draught flues are arranged in the central joint of the cell cavity and at the multiple spots of the side surface of the cell cavity. The invention is beneficial to the uniform heating of the cell cavity, reducing of the temperature difference between all areas and the oxidation of the carbon blocks in the baking process.
Owner:ZHENGZHOU ZHONGSHI CELL TECH

Solar simulator optical system for testing triple-junction gallium arsenide solar cell

InactiveCN106764680AImprove Spectral Matching AccuracyMeet the test requirementsSpectral modifiersRefractorsSolar lightIntegrator
The invention provides a solar simulator optical system for testing a triple-junction gallium arsenide solar cell, and relates to the technical field of light spectrum, aiming at solving the problems of an existing solar simulator optical system that difference is formed between a partial spectrum band and a solar light spectrum, so that measurement requirements cannot be met and the like. The solar simulator optical system comprises a xenon lamp, an ellipsoidal reflecting mirror, an optical filter array, a first plane reflecting mirror, an AM0 optical filter, an optical integrator, a second plane reflecting mirror and a collimator objective, and further comprises an optical filter array; the optical filter array comprises two first optical filters, two second optical filters and two third optical filters; the two first optical filters, the two second optical filters and the two third optical filters are uniformly distributed along the periphery at intervals; light emitted by the xenon lam is reflected by the ellipsoidal reflecting mirror, and then is filtered through the optical filter array; after the direction of a light beam is changed through the first plane reflecting mirror, the light is filtered through the AM0 optical filter again, and is converged on the optical integrator; then the light passes through the optical integrator, the second plane reflecting mirror and the collimator objective in sequence and then is projected onto an irradiation surface, so as to form the uniform irradiation surface.
Owner:CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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