Cascaded model predictive control (mpc) approach for plantwide control and optimization
A predictive control and controller technology, applied in general control systems, adaptive control, control/regulation systems, etc., can solve problems such as the failure to achieve optimal benefits
Inactive Publication Date: 2017-08-29
HONEYWELL INT INC
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As a result, substantial optimization gains are still unattainable
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Abstract
A method includes obtaining (1702) a planning model (200) for an industrial facility at a master MPC controller (302) and sending (1706) at least one optimization call from the master MPC controller to one or more slave MPC controllers (304a-304n). The method also includes receiving (1708) at least one proxy limit value from the slave MPC controller(s) in response to the at least one optimization call. The at least one proxy limit value identifies to what extent one or more process variables controlled by the slave MPC controller(s) are adjustable without violating any process variable constraints. In addition, the method includes performing (1710) plantwide optimization at the master MPC controller using the planning model and the at least one proxy limit value. The at least one proxy limit value allows the master MPC controller to honor the process variable constraints of the slave MPC controller(s) during the plantwide optimization.
Description
Apparatus and method for computing proxy limits to support cascaded model predictive control (MPC) Cross References and Priority Claims to Related Applications This application claims priority under 35 U.S.C. §120 as a continuation-in-part of US Patent Application Serial No. 14 / 336,888 filed July 21, 2014, which is hereby incorporated by reference in its entirety. technical field The present disclosure relates generally to industrial process control and automation systems. More specifically, the present disclosure relates to an apparatus and method for computing proxy limits for supporting cascaded model predictive control (MPC). Background technique Industrial process control and automation systems are often used to manage processing facilities. Many control and automation systems include multiple hierarchical layers that perform different functions. For example, lower layers can include devices that perform process control functions and model predictive control (MPC...
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Patent Type & Authority Applications(China)
IPC IPC(8): H04L12/24H04L29/08
CPCH04L41/042H04L41/0823H04L41/145H04L67/12G05B13/048
Inventor 卢祝新
Owner HONEYWELL INT INC
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