Exposure base and exposure equipment
A base and component technology, which is applied in microlithography exposure equipment, photomechanical equipment, exposure devices for photo-plate making process, etc., can solve the problems of low stability of exposure base, and achieve low stability and reduced vibration , the effect of improving stability
Inactive Publication Date: 2018-10-30
BOE TECH GRP CO LTD +1
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Problems solved by technology
[0006] In order to solve the problem of low stability of the exposure base, the present invention provides an exposure base and exposure equipment
Method used
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[0036] In order to make the purpose, technical solutions and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings. Obviously, the described embodiments are only some of the embodiments of the present invention, rather than all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0037] In the manufacturing process of the display substrate, it is usually necessary to form a thin film on the substrate, then coat the photoresist on the thin film, and use the exposure base to lift the substrate to the vicinity of the mask (English: Mask) for exposure. During the process of lifting the substrate, the exposure base needs to go through accelerated motion, uniform motion and deceleration motion in sequence. The exposure...
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The invention discloses an exposure base and exposure equipment and belongs to the technical field of display. The exposure base comprises a bearing assembly, a buffering assembly and a supporting assembly, wherein the bearing assembly comprises a bearing surface and a fixed surface opposite to the bearing surface, one end of the buffering assembly and one end of the supporting assembly are both fixed ends, the other end of the buffering assembly and the other end of the supporting assembly are fixedly connected with the bearing assembly respectively, and the buffering assembly and the supporting assembly are located on the side where the fixed surface is located; the bearing surface is used for bearing a substrate, the supporting assembly is used for supporting the bearing assembly, and the buffering assembly is used for buffering the bearing assembly when the supporting assembly supports the bearing assembly. According to the exposure base and the exposure equipment, the problem of poorer stability of the exposure base is solved, and improvement of the stability of the exposure base is facilitated. The invention is applied to the exposure base.
Description
technical field [0001] The invention relates to the field of display technology, in particular to an exposure base and exposure equipment. Background technique [0002] In the manufacturing process of the display substrate, it is usually necessary to form a thin film on the substrate (substrate substrate or a substrate with a certain pattern), and then coat the photoresist on the film, and use exposure equipment to pass through a mask with a certain pattern. The plate is exposed to the photoresist. Wherein, the exposure equipment includes an exposure base, and the mask plate is set above the exposure base. During exposure, the substrate can be placed on the exposure base, and the exposure base is used to lift the substrate to the vicinity of the mask, and then pass The mask exposes the substrate. [0003] In the related art, the exposure base includes a bearing plate, a slide rail, a slider, a lifting rod, a motor and a fixed base. The bearing plate has a bearing surface a...
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IPC IPC(8): G03F7/20
CPCG03F7/70716
Inventor 井杨坤
Owner BOE TECH GRP CO LTD