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Imprint apparatus, method of imprinting, method for producing article, and mold

A technology of imprinting equipment and molds, which is applied in the direction of optomechanical equipment, semiconductor/solid-state device manufacturing, and photoplate-making process of patterned surface, etc., which can solve the problems of reducing alignment accuracy and so on

Inactive Publication Date: 2017-10-20
CANON KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this case, after correcting the shape of the shot area by heating, the mold and the imprint material applied on the substrate are in contact with each other, so that the heat of the substrate is absorbed in the mold by the imprint material to change the shape of the shot area, reducing the impact on Accurate

Method used

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  • Imprint apparatus, method of imprinting, method for producing article, and mold
  • Imprint apparatus, method of imprinting, method for producing article, and mold
  • Imprint apparatus, method of imprinting, method for producing article, and mold

Examples

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no. 1 example

[0021] figure 1 is a diagram showing a representative example of an imprint apparatus. The imprint apparatus 1 is an apparatus that forms a pattern of a cured material, and transfers the concavo-convex pattern of the mold to the cured material by bringing the mold and the imprint material supplied onto the substrate into contact with each other and by giving the imprint material energy for curing. pattern. In this embodiment, the imprint apparatus 1 is an imprint apparatus employing a photocuring method. exist figure 1 , the Z axis is obtained parallel to the optical axis of the illumination system that applies light to the imprint material 14 on the substrate 10, and the X and Y axes intersecting at right angles are obtained in a plane perpendicular to the Z axis. X, Y, and Z axes are also defined in other figures.

[0022] The imprint apparatus 1 includes a light irradiation unit 2 , a mold holding mechanism 3 , a stage 4 , an application unit 5 , a heating mechanism (he...

no. 2 example

[0071] An imprint apparatus according to a second embodiment will be described. Figure 6 It is a diagram showing the arrangement and installation of the mold heating mechanism. The imprint apparatus of this embodiment is characterized in that it includes a mold heating mechanism (mold heating unit) 61 having an infrared radiation source 62 such as Figure 6 shown. The mold heating mechanism 61 heats the mold 8 by irradiating the mold 8 with light. The mold heating mechanism 61 includes: an infrared radiation source 62 that emits infrared rays for heating the mold 8, a mold light adjuster (adjustment unit) 63 that adjusts the dose distribution of the emitted infrared rays, and limits the optical path of the adjusted infrared rays 64 so that the infrared rays 64 Reflector 65 directed towards the surface of mold 8 . Infrared rays may be light having a wavelength band of, for example, 750 nm to 1,000 μm. When the mold 8 is made of quartz, infrared rays applied to the mold 8 a...

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Abstract

An imprint apparatus for forming a pattern of an imprint material on a process area of a substrate by using a mold including a patterned portion includes a heating unit. The heating unit heats the substrate such that a difference in shape between the process area and the patterned portion is reduced and heats the mold such that a difference in temperature between the mold and the heated substrate is reduced.

Description

technical field [0001] The present disclosure relates to an imprinting apparatus, an imprinting method, a method of manufacturing an article, and a mold. Background technique [0002] With increasing demand for miniaturization of semiconductor devices and microelectromechanical systems (MEMS), in addition to known photolithography, imprinting materials are molded on substrates using molds to form patterns of imprinting materials on substrates The microfabrication technology has also attracted attention. This technique is also called imprint technique. Using this technology, fine structures on the order of several nanometers can be formed on a substrate. One example of an imprint technique is a photocuring method. An imprint apparatus using a photo-curing method first applies a photo-curable imprint material onto a projected area as an imprint area on a substrate. Next, the imprinting apparatus shapes the imprinted material using a mold. Subsequently, the imprint apparat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
CPCG03F7/0002B29C43/52B29K2905/08G03F7/0032G03F7/38G03F7/70308G03F7/70875H01L21/0274H01L21/324H01L21/67248B29C43/021
Inventor 林达也中川一树村上洋介
Owner CANON KK