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Quartz cavity cleaning device and cleaning method

A technology for cleaning devices and quartz chambers, applied to cleaning methods and appliances, chemical instruments and methods, and cleaning hollow objects, etc., can solve problems such as external erosion of quartz chambers, reduce usage, save costs, and prolong service life Effect

Active Publication Date: 2021-02-12
ZING SEMICON CORP
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Problems solved by technology

[0005] The purpose of the present invention is to provide a cleaning device for a quartz cavity and a method for cleaning the quartz cavity according to the cleaning device for the quartz cavity, so as to solve the problem of the existing cleaning device cleaning the quartz cavity. The outside of the cavity creates erosion problems

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  • Quartz cavity cleaning device and cleaning method
  • Quartz cavity cleaning device and cleaning method
  • Quartz cavity cleaning device and cleaning method

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Embodiment Construction

[0041] As described in the background technology, when the cleaning device in the prior art is used to clean the quartz cavity through the immersion cleaning method, although the purpose of cleaning the inside of the quartz cavity can be achieved, at the same time, the cleaning liquid will also affect the quartz cavity. The outside of the body will cause erosion, which will greatly shorten the service life of the quartz cavity. Therefore, the present invention improves the cleaning device to avoid the problem that the cleaning liquid corrodes the outside of the quartz cavity during the cleaning process, so as to prolong the service life of the quartz cavity.

[0042] The cleaning device for the quartz cavity provided by the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. Advantages and features of the present invention will be apparent from the following description and claims. It should be no...

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Abstract

The invention provides a cleaning device and a cleaning method for a quartz cavity. The cleaning device includes: a cleaning cavity, a liquid inlet, a liquid discharge port and a sealing gasket arranged at the bottom of the cleaning cavity; During the process, the sealing gasket is in contact with the opening of the quartz chamber and seals the opening, wherein both the liquid inlet and the liquid outlet are located in the projected area of ​​the opening on the bottom of the cleaning chamber. When the cleaning device provided by the present invention is used to clean the quartz cavity, since the sealing gasket can seal the opening of the quartz cavity, the cleaning liquid only passes into the inside of the quartz cavity, thereby preventing the cleaning liquid from leaking out and ensuring that the quartz cavity The outside of the body is not corroded by the cleaning solution.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a cleaning device and a cleaning method for a quartz cavity. Background technique [0002] Because the quartz cavity contains less metal impurities, its main substance is high-purity silicon dioxide, and can withstand high temperatures up to 1200 degrees, so the quartz cavity is widely used in semiconductor manufacturing technology. For example, in the epitaxy process, a silicon wafer is placed inside a quartz chamber to carry out epitaxial growth, that is, a reaction source is passed into the quartz chamber where the silicon wafer is placed, and the reaction source is under certain conditions The reaction occurs and a uniform film is deposited on the surface of the silicon wafer. However, during this process, the film is not only deposited on the surface of the silicon wafer, but also on the inner wall of the quartz cavity. Therefore, after several depositi...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B9/08
CPCB08B9/08
Inventor 赵旭良汪燕
Owner ZING SEMICON CORP
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