Novel thin bed resistivity log response correction method
A technology of sheet resistance and new method, which is applied in data processing applications, electrical digital data processing, special data processing applications, etc. Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0140] For a certain thin oil layer, the new method for correcting the thin layer resistivity logging response provided by the present invention is used to correct the measured resistivity logging curve of the thin layer, and the correction results are as follows Figure 5 As shown in the figure, it can be seen that the resistivity of the thin oil layer after correction is larger than that before correction, indicating that due to the influence of the surrounding rock, the measured resistivity of the thin oil layer is generally low, and it is necessary to correct it , the oil saturation calculated by the corrected resistivity is closer to the true oil saturation of the thin layer than the one calculated by the measured resistivity.
Embodiment 2
[0142] For a certain thin water layer, the new method for correcting the thin layer resistivity logging response provided by the present invention is used to correct the measured resistivity logging curve of the thin layer, and the correction results are as follows Image 6 As shown in the figure, it can be seen that the thin water layer is generally lower after correction than before correction, and the decrease is related to factors such as formation water resistivity, water saturation of the layer, and resistivity of upper and lower surrounding rocks.
[0143] The beneficial effects of the new method for correcting thin layer resistivity logging response provided by the present invention are: the new method for correcting thin layer resistivity logging response provided by the present invention establishes a geometric factor correction model through the analysis of thin layer geometric factors , a new method for thin layer resistivity correction is given. This new method can...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com