Discretized film system design method of broadband euv multilayer film based on qiga

A technology of membrane system design and design method, applied in the direction of genetic laws, genetic models, instruments, etc., to achieve the effect of increasing diversity, good population diversity characteristics, high solution efficiency and accuracy

Active Publication Date: 2020-02-07
CHANGCHUN UNIV OF SCI & TECH
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Problems solved by technology

However, in general sputtering technology, such as magnetron sputtering technology, the deposition rate is relatively high, and it is difficult to achieve high-precision deposition of film thickness through time control alone. Generally, the film thickness that can be precisely plated is based on the deposition rate as the tolerance. A series of discretized film thicknesses

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  • Discretized film system design method of broadband euv multilayer film based on qiga
  • Discretized film system design method of broadband euv multilayer film based on qiga
  • Discretized film system design method of broadband euv multilayer film based on qiga

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application example 1

[0112] Application example 1: Application of QIGA to the design of wide-angle Mo / Si multilayer film. image 3 The comparison of the solution efficiency of the wide-angle Mo / Si multilayer film design based on EA, GA and QIGA is given. The results show that: GA has a "premature" phenomenon, which falls into a local extreme, which leads to the lowest solution accuracy of the algorithm. The convergence speed of EA finds the global optimal solution around 500 generations, while QIGA finds the global extremum around 400 generations. At the same time, the solution accuracy of EA is also lower than that of QIGA. The above results all indicate that QIGA uses qubits to encode chromosomes, and one chromosome can represent the superposition of multiple states, thereby increasing the diversity of the population. The quantum revolving gate performs adaptive mutation and improves the convergence speed and solution accuracy of the algorithm. . Figure 4 The reflectance spectra of the optimal ...

application example 2

[0114] Application example 2: Application of QIGA to the design of wide-spectrum Mo / Si multilayer film. First, draw a comparison chart of the solution efficiency of the discretization design of the wide-spectrum Mo / Si multilayer film based on EA, GA and QIGA, such as Picture 9 Shown. The comparative analysis shows that the solution accuracy of GA is much lower than that of QIGA, and the phenomenon of "stagnation" appears in the 100th generation. However, the solution efficiency and accuracy of EA are not as high as those of QIGA. In order to further prove that the multi-layer film designed based on QIGA has superior spectral performance, a comparison of the reflection spectra of the optimal solution after 4500 generations of the design evolution of the broad-spectrum Mo / Si multi-layer film based on QIGA, EA and GA was drawn. Figure, as Picture 10 Shown. The reflection spectrum bandwidth of the reflection spectrum based on the GA inverse performance is narrow, the fluctuatio...

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Abstract

The present invention discloses a QIGA(quantum inspired genetic algorithm)-based discretized film system design method of a broadband EUV (extreme ultraviolet) multilayer film. The method comprises the following steps that: 1) the initial parameter values of the design method are inputted; and 2) quantum encoding is performed on the film layer deposition time of the multilayer film, so that an initial quantum group Q (t) can be generated; (3) observation states R (t) of quantum superposition states are constructed according to the quantum probability amplitude of the individuals in the initial quantum group Q (t); (4) whether a termination condition is satisfied is judged, if the termination condition is satisfied, the method stops and outputs an optimal solution, otherwise, the method continues; (5) the fitness of individuals in the R (t), which characterizes the deposition time of a discretized film system, is calculated, individuals corresponding the optimal deposition time of thefilm system are saved; (6) a quantum rotation gate is updated, and the updated quantum rotation gate is adopted to update the Q (t); (7) the Q (t) is observed, R (t) is generated and is evaluated, optimal individuals are retained; (8) the Q (t) is updated through a quantum NOT gate; and (9) an elite retention strategy is adopted, and the method shifts to step (4). With the method of the inventionadopted, problems such as low solution efficiency and high requirement for thickness control precision during film coating of an existing EUV multilayer film design method can be solved.

Description

Technical field [0001] The invention specifically relates to a method for designing a discretized film system of a broadband extreme ultraviolet (EUV) multilayer film based on a quantum derived genetic algorithm (QIGA), and belongs to the field of EUV multilayer film research and development. Background technique [0002] Lithography technology is the main process in the production of semiconductor industry today, and the mirror based on the extreme ultraviolet (EUV) multilayer film design is the most potential lithography technology-the core reflective element of EUV lithography technology. Because EUV multilayer film can achieve high reflectivity in the EUV band, it is also widely used in EUV astronomy, EUV spectroscopy, synchrotron radiation and many other fields. Therefore, the research and development of EUV multilayer film has attracted the attention of relevant people at home and abroad. At present, the extreme ultraviolet Mo / Si multilayer film can achieve a reflectivity ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B27/00G06N3/12
CPCG02B27/0012G06N3/126
Inventor 匡尚奇张超
Owner CHANGCHUN UNIV OF SCI & TECH
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