Moisturizing and leisurely facial mask and preparation method thereof

A facial mask and moisturizing technology, applied in pharmaceutical formulations, cosmetic preparations, cosmetic preparations, etc., can solve the problems of non-compliance with anti-aging, anti-inflammatory and anti-allergic, unavoidable irritation, and unstable effects, so as to promote the production of With the effect of detoxification, smooth and silky skin, reducing free radical damage

Inactive Publication Date: 2018-05-01
KINGWAY COSMETICS TECH GUANGZHOU CO LTD
View PDF5 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The effect of this self-made facial mask is not stable, not only unsuitable for industrial production, its irritation is unavoidable, but also th

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Moisturizing and leisurely facial mask and preparation method thereof
  • Moisturizing and leisurely facial mask and preparation method thereof
  • Moisturizing and leisurely facial mask and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] Weigh each raw material according to parts by mass: 0.14 parts of carbomer 941, 0.06 parts of sclerotin, 8 parts of 1,3 butanediol, 6 parts of glycerin, 0.2 parts of allantoin, 0.1 part of dipotassium glycyrrhizinate, 0.5 parts Purslane, 0.3 part of zymosan, 0.02 part of hyaluronic acid, 0.1 part of methylparaben, 0.25 part of phenoxyethanol, 0.2 part of 1,2-pentanediol, 0.15 part of triethanolamine, and 83.97 parts of sterile water.

[0038] On the basis of the composition of the above-mentioned raw materials, the following steps are followed to prepare the described moisturizing and leisurely facial mask essence:

[0039] S1. Dissolve phenoxyethanol, methylparaben, and 1,2-pentanediol in 1 part of 1,3-butanediol, heat to above 75°C, stir until completely dissolved, add to the emulsification pot, and Add carbomer 941, sclerotin, 1,3 butanediol, glycerin, and allantoin, heat and homogenize for 5 minutes, keep warm for 20 minutes, and stir evenly;

[0040] S2. After coo...

Embodiment 2

[0043] Weigh each raw material according to parts by mass: 0.15 parts of carbomer 941, 1 part of sclerotin, 9 parts of 1,3 butanediol, 4 parts of glycerin, 0.1 part of allantoin, 0.08 part of dipotassium glycyrrhizinate, 0.4 part Purslane, 0.4 part of zymosan, 0.01 part of hyaluronic acid, 0.1 part of methylparaben, 0.25 part of phenoxyethanol, 0.1 part of 1,2-pentanediol, 0.15 part of triethanolamine, and 84.25 parts of sterile water.

[0044] On the basis of the composition of the above-mentioned raw materials, the following steps are followed to prepare the described moisturizing and leisurely facial mask essence:

[0045] S1. Dissolve phenoxyethanol, methylparaben, and 1,2-pentanediol in 1 part of 1,3-butanediol, heat to above 75°C, stir until completely dissolved, add to the emulsification pot, and Add carbomer 941, sclerotin, 1,3 butanediol, glycerin, and allantoin, heat and homogenize for 5 minutes, keep warm for 20 minutes, and stir evenly;

[0046] S2. After cooling th...

Embodiment 3

[0049] Weigh each raw material according to parts by mass: 0.16 part of carbomer 941, 0.05 part of sclerotin, 7 parts of 1,3 butanediol, 6 parts of glycerin, 0.3 part of allantoin, 0.12 part of dipotassium glycyrrhizinate, 0.8 part Purslane, 0.5 part of zymosan, 0.04 part of hyaluronic acid, 0.1 part of methylparaben, 0.25 part of phenoxyethanol, 0.3 part of 1,2-pentanediol, 0.15 part of triethanolamine, and 84.22 parts of sterile water.

[0050] Follow the steps below to prepare the described Hydrating Essence Mask Essence:

[0051] S1. Dissolve phenoxyethanol, methylparaben, and 1,2-pentanediol in 1 part of 1,3-butanediol, heat to above 75°C, stir until completely dissolved, add to the emulsification pot, and Add carbomer 941, sclerotin, 1,3 butanediol, glycerin, and allantoin, heat and homogenize for 5 minutes, keep warm for 20 minutes, and stir evenly;

[0052] S2. After cooling the system obtained in step S1 to below 45°C, add other materials such as zymosan and purslane...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses moisturizing and leisurely facial mask essence and a preparation method thereof. The raw materials is in total mass of 100 parts, and the moisturizing and leisurely facial maskessence is prepared from the following components: 0.14 to 0.18 part of carbomer 941, 0.05 to 0.1 part of sclerotium gum, 7 to 10 parts of 1,3-butanediol, 3 to 6 parts of glycerol, 0.1 to 0.3 part ofallantoin, 0.08 to 0.12 part of dipotassium glycyrrhizinate, 0.4 to 0.8 part of herba portulacae extract, 0.3 to 0.6 part of zymosan, 0.01 to 0.05 part of hyaluronic acid, 0.35 part of preservative,0.1 to 0 .3 of 1,2-pentanediol, 0.15 part of triethanolamine, 0 to 0.005 part of odorant and/or pigment, and the balance of water. According to synergistic action and mutual influence of each active ingredient, the moisturizing and leisurely facial mask essence precisely limits the applied amount of herba portulacae extract, exerts effective anti-inflammatory and anti-sensitivity effects, and synergizes with other various moisturizing factors to obtain a moisturizing facial mask with anti-allergic effect. After use of the moisturizing facial mask, a skin feels smooth and delicate. The moisturizing facial mask can effectively soothe sensitive skin, eliminate skin inflammation, resist oxidation, and reduce free radical damage, and is safe and reliable.

Description

technical field [0001] The invention relates to the technical field of facial masks of skin care products, and more specifically, to a moisturizing and mellow facial mask essence and a preparation method thereof. Background technique [0002] Purslane contains active substances such as omega-3 fatty acids, Vc, Vb and mineral elements, betaine and anthocyanins, and has anti-oxidation and anti-mutagenic properties. It was used to treat constipation and urinary system inflammation in ancient Greece Its natural anti-oxidation, anti-inflammation, anti-free radical, inhibition of tyrosinase activity and other functions have gained wide attention in the fields of cosmetics, functional food, and medicine, making the extraction of active substances in purslane Development and functional application has become a research hotspot in recent years. [0003] There is a folk method of homemade purslane mask. Specifically, clean the purslane, remove the roots, squeeze it into juice with a ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): A61K8/9789A61K8/73A61K8/49A61K8/63A61Q19/00A61Q19/08
CPCA61K8/97A61K8/4946A61K8/63A61K8/73A61K8/735A61K2800/75A61Q19/00A61Q19/005A61Q19/08
Inventor 杨菊曹波黄振振刘运花
Owner KINGWAY COSMETICS TECH GUANGZHOU CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap