A tail gas treatment device with an overflow cavity

Abstract

The present invention provides a tail gas treatment device, and the tail gas treatment device comprises a sink having a upper portion provided with a gas inlet and a gas outlet, an overflow chamber disposed at one side of the sink and a partition disposed between the sink and the overflow chamber. When the vertical level of liquid received in the sink reaches the top of the partition, floccus silicide floating at the liquid can flow into the overflow chamber across the partition; at least one nozzle mounted on the upper portion of the overflow chamber, and the nozzle can spray water on the floccus silicide for breaking the floccus silicide into pieces; an exhaustion port disposed at the lower portion of the overflow chamber and the exhaustion port can exhaust floccus silicide; and an electromagnetic valve connected with the exhaustion port, and the electromagnetic valve can open or close the exhaustion port. Via the constructions of the overflow chamber, the floccus silicide can directly flow into the overflow chamber from the sink and can be exhausted from tail gas treatment device efficiently, such that the period of preventive maintenance can be prolonged greatly, the economic benefit of epitaxy can be increased, the advantages of the tail gas treatment device include: simple structure, remarkable effect, low cost, and easy maintenance.

Description

technical field [0001] The invention belongs to the field of semiconductor manufacturing and relates to an exhaust gas treatment device with an overflow chamber. Background technique [0002] A large amount of HCl, trichlorosilane (TCS), B 2 h 6 ,PH 3 , H 2 and other special gases. Exhaust gas processor for epitaxy is a device specially designed to deal with epitaxy exhaust gas. The exhaust pipe of the epitaxial furnace is connected to the air inlet of the tail gas processor, and the epitaxial waste gas enters the tail gas treatment to react, and then discharges the non-polluting gas. [0003] General tail gas treatment devices include combustion type, water washing type and so on. The water washing type is connected to a special venturi tube through the exhaust port of the exhaust gas processor, and relies on the negative pressure provided by the venturi tube to draw the process gas in the epitaxial furnace into the exhaust gas processor. In the exhaust processor, HC...

AI Technical Summary

Problems solved by technology

[0006] In view of the above-mentioned shortcomings of the prior art, the object of the present invention is to provide an exhaust gas treatment device with an overflow chamber, which is used to solve the problem of low removal efficiency of flocculent silicides in the prior art, high cost, and maintenance problems. cumbersome questions

Images