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Shading device for semiconductor processing chamber and method of use thereof

A technology for shielding devices and processing chambers, which is applied in vacuum evaporation plating, coating, gaseous chemical plating, etc., and can solve problems such as the inability to maintain the gap, the collision between the shielding ring and the carrier plate, etc.

Active Publication Date: 2020-04-24
PIOTECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, when the carrier plate must be processed closer to the spray head, the shielding ring and the carrier plate must collide, and a proper gap cannot be maintained between the two

Method used

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  • Shading device for semiconductor processing chamber and method of use thereof
  • Shading device for semiconductor processing chamber and method of use thereof
  • Shading device for semiconductor processing chamber and method of use thereof

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Embodiment Construction

[0028] In this specification and the following patent claims, unless the context requires otherwise, the word "comprise" and variants such as "comprising" or "comprising" will be understood as implying that the integer group or step is included, but Any other integer or group of integers is not excluded.

[0029] figure 2 It is the semiconductor processing cavity 20 of the present invention and the shielding device 30 used for the semiconductor processing cavity. The processing chamber has a top 210 , a bottom 220 , a side wall 230 and a carrier plate 240 . The top 210 , bottom 220 and sidewalls 230 are coupled with each other to define the cavity space.

[0030] The top 210 can be coupled to the upper end of the sidewall 230 via a sealing means. The top 210 includes one or more shower assemblies 211 coupled below the top 210 to provide gases for the deposition process. Generally speaking, the shower assembly 211 is a part of the reaction gas supply system, including one ...

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PUM

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Abstract

The invention discloses a shading device for a semiconductor treatment cavity and a use method of the shading device. The shading device comprises a shading ring and a supporting assembly; a pluralityof convex blocks are arranged on the bottom surface of the shading ring and used for preventing a bearing disc of the semiconductor treatment cavity from being contacted with the shading ring; the supporting assembly is connected to the shading ring; and the bottom surface of the supporting assembly is configured to be in contact with one or more projecting parts in the semiconductor treatment cavity, so that the shading ring is supported in a position above the projecting parts.

Description

technical field [0001] The invention relates to the field of semiconductor wafer processing, in particular to a shielding device in a semiconductor processing chamber, which is used to prevent deposition around the wafer during processing. Background technique [0002] In the semiconductor manufacturing process, it includes deposition processing, such as chemical vapor deposition (CVD), which can form various thin films on wafers or substrates to manufacture semiconductor devices, such as integrated circuits and semiconductor light emitting devices. figure 1 It is a partial schematic diagram showing that a wafer or a substrate supported by a carrying plate is formed with a thin film formed by the deposition process, wherein the surrounding of the carrying plate has a stepped structure, such as a ceramic ring, which can be configured to Prevent wafer horizontal drift. In addition, the ceramic ring can also cooperate with a heating means to heat the wafer. During the deposit...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/04C23C14/04
CPCC23C14/042C23C16/042
Inventor 柴智
Owner PIOTECH CO LTD