Vapor discharge apparatus and film formation method

Abstract

The purpose of the present invention is to provide a technique such that when forming an organic compound film on a substrate film in vacuum, vapor of an organic compound monomer can be generated at aconstant rate, thereby stabilizing the film formation rate. This vapor discharge apparatus discharges vapor of an organic compound monomer in vacuum and comprises: a vaporization unit 21 for vaporizing a liquid organic compound monomer; and a vapor discharge unit 22 that is in communication with the vaporization unit 21 and discharges the vapor of the organic compound monomer vaporized by the vaporization unit 21. The vaporization unit 21 is provided therein with a hollow vaporizer 40. The vaporizer 40 is configured such that a mist of the liquid organic compound monomer is introduced therein, the organic compound monomer mist 34 is heated and vaporized, and the organic compound monomer vapor is discharged to the vaporization unit 21.

Description

technical field [0001] The present invention relates to the technology of a film forming apparatus for forming an organic compound film on a substrate film in vacuum. Background technique [0002] In recent years, there has been a demand to efficiently form electronic components on a base material film, and therefore, a technique of transporting a long base material film in a vacuum to form a film composed of a high-molecular organic compound on the base material film has been proposed. . [0003] Conventionally, in the case of forming a high-molecular organic compound film on a base material film in a vacuum, for example, the steps of evaporating an organic compound monomer and spraying the vapor onto the base material film to form an organic compound layer are The organic compound layer is cured by heating or irradiating energy rays to form a polymeric organic compound film. [0004] However, there are various problems in forming a polymeric organic compound film on a ba...

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Problems solved by technology

[0004] However, there are various problems in forming a polymeric organic compound film on a substrate film by such a method in a vacuum.

[0005] That is, it is difficult to form a film of an organic compound monomer on a base material film with a uniform film thickness in a vacuum. In particular, it is very difficult to generate a vapor of an organic compound monomer at a constant rate and to stabilize the film formation rate.

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