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483 results about "Formation rate" patented technology

Device and method for generating micro-fluidic droplets based on surface acoustic waves

The invention discloses a device and a method for generating micro-fluidic droplets based on surface acoustic waves. The device comprises a piezoelectric substrate, a set of curved interdigital transducers is arranged on the piezoelectric substrate, a closed PDMS micro-channel system is applied to the upper part of the piezoelectric substrate, and the closed PDMS micro-channel system is formed bytop PDMS and a PDMS sealing film. The method comprises the following steps: fixing the micro-fluidic droplet generating device on the objective table of a microscope, switching in the micro-fluidic droplet generating device, and setting the pressures of a dispersed phase inlet joint and a continuous phase inlet joint; and connecting a signal generator with the curved interdigital transducers, adjusting the output signal of the signal generator, turning on a syringe pump, adjusting and stabilizing the two-phase interface position of a dispersed phase and a continuous phase, and generating the micro-fluidic droplets. The device and the method realize the electric control of the formation rate and the size of the droplets; and the device has a small size and can be integrated with other devices, so the repeatability is enhanced, and cracks between channels, caused by overlarge pressure of an input fluid, are reduced.
Owner:XI AN JIAOTONG UNIV

Sunlight greenhouse hot pepper seedling culturing substrate and preparation method thereof

The invention discloses a sunlight greenhouse hot pepper seedling culturing substrate and a preparation method thereof. The preparation method comprises the following step of: performing plug seedling by taking decomposed maize straws, dairy manure, vermiculite and grass carbon as materials, using 5 kinds of compound substrates with different volume mixture ratios and taking hot pepper (Longjiao No.2) as a test material, wherein when the volume ratio of the decomposed maize straws to the decomposed dairy manure to the grass carbon to the vermiculite is 2:4:2:2 according to a screened substrate formula, an optimal seeding culturing effect can be achieved. The seedling culturing substrate has the advantages of scientific formula, simple process, high plug seedling formation rate, good weight, physicochemical indexes meeting the requirement of a seeding culturing substrate and good seeding culturing effect. After the seedling culturing substrate is applied, the production cost of a cultivating substrate can be lowered remarkably, the yield and the quality of hot pepper are improved, the incomes of peasants are increased, and the popularization and the application of an organic ecological soilless seedling culturing technology are accelerated.
Owner:GANSU AGRI UNIV

Thin film forming apparatus and method

The present invention provides an efficient thin film forming apparatus which is capable of correcting a film thickness so as to take care of a variation in distribution in the film thickness and to take care of the circumferential distribution of the film thickness, as well as a method for forming a thin film using this film forming apparatus. The method comprises the first step of first forming a thin film to a predetermined percentage out of thickness through an opening 8a in a shutter 8, the second step of then using a film thickness monitor 10 to measure the distribution of the thickness of the thin film formed in the first step, and the third step of reducing a film formation rate by an opening 8b in the shutter 8 between a substrate 4 and a sputtering cathode 6 as compared to that of the first step and correcting the thickness of the thin film by an opening 13a in the first film thickness correcting plate 13 between the substrate 4 and the sputtering cathode 6 corresponding to the distribution of the film thickness measured by the film thickness monitor 10 in the second step. Then, the second step is carried out again, during which the film thickness monitor 10 is used to measure the distribution of the thickness of the thin film formed in the third step. Further, the third and second steps are repeatedly carried out.
Owner:ULVAC INC
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