219results about How to "Addressing Insufficient Sensitivity" patented technology

An integral microfluidic device includes an alkali vapor cell and microfluidic channel, which can be used to detect magnetism for nuclear magnetic resonance (NMR) and magnetic resonance imaging (MRI). Small magnetic fields in the vicinity of the vapor cell can be measured by optically polarizing and probing the spin precession in the small magnetic field. This can then be used to detect the magnetic field of in encoded analyte in the adjacent microfluidic channel. The magnetism in the microfluidic channel can be modulated by applying an appropriate series of radio or audio frequency pulses upstream from the microfluidic chip (the remote detection modality) to yield a sensitive means of detecting NMR and MRI.

Microwave examination of individuals is carried out by transmitting microwave signals from multiple antenna locations into an individual and receiving the backscattered microwave signals at multiple antenna locations to provide received signals from the antennas. The received signals are processed to remove the skin interface reflection component of the signal and the corrected signal data are provided to a hypothesis testing process. In hypothesis testing for detecting tumors, image data are formed from the test statistic used to perform a binary hypothesis test at each voxel. The null hypothesis asserts that no tumor is present at a candidate voxel location. The voxel threshold is determined by specifying a false discovery rate to control the expected proportion of false positives in the image. When the test statistic value associated with a voxel is greater than the threshold, the null hypothesis is rejected and the test statistic is assigned to the voxel. For voxels where the test statistic falls below the threshold, the null hypothesis is accepted and the voxel value is set to zero. The resulting image indicates the locations or other characteristics of detected tumors.

A capacitance detecting circuit detects, in terms of voltage, change in capacitance at intersections of a plurality of column lines and a plurality of row lines crossing each other. The capacitance detecting circuit includes a column-line driving unit for driving a column line; a row-line selector for selecting a specific row line from the plurality of row lines; and a capacitance calculator for calculating a capacitance at an intersection of the specific row line and the driven column line based on a reference current that flows in relation to a reference capacitance and a current that flows in relation to the capacitance at the intersection.

An electrophotographic photosensitive member is provided which can keep at a minimum the absorption of image exposure light of 380 to 500 nm in wavelength in its surface layer and concurrently can satisfactorily keep electrophotographic properties including resolving power. The electrophotographic photosensitive member has a substrate, and a photoconductive layer and a surface layer in this order provided on the substrate. The surface layer includes an amorphous material composed chiefly of silicon atoms and nitrogen atoms and containing at least oxygen atoms and carbon atoms, and the ratios of the numbers of the respective oxygen atoms, carbon atoms and nitrogen atoms to the total number of oxygen atoms, carbon atoms and nitrogen atoms contained in the amorphous material are each within a specific range.

An electrophotographic photosensitive member is provided minimizing the absorption of image exposure having a short wavelength in a surface layer and keeping good electrophotographic properties including resolving power. The electrophotographic photosensitive member includes a conductive substrate, and a photoconductive layer and a surface region layer sequentially superimposed on the conductive substrate. The surface region layer is composed of a non-single-crystal silicon nitride film containing an Group element in the periodic table and a carbon atom and using at least a silicon atom and a nitrogen atom as base materials. In the surface region layer, the Group 13 element content with respect to the total amount of constituent atoms has distribution having at least two local maximum values in the thickness direction, and an the average concentration of nitrogen atoms is 30 atm % to 70 atm %.