The invention provides a
tunneling field effect transistor, a preparation method thereof and a photoelectric
detector, and relates to the field of photoelectric devices.The
tunneling field effect transistor comprises a substrate, an insulating layer, a conductive layer, a
dielectric layer, a
heterojunction layer and a packaging layer, the
heterojunction layer comprises a first
semiconductor layer and a second
semiconductor layer, the first
semiconductor layer is stacked on the
dielectric layer, at least part of the second semiconductor layer is stacked on the first semiconductor layer, and the other part of the second semiconductor layer is stacked on the
dielectric layer; the first semiconductor layer comprises a
tin disulfide layer, the second semiconductor layer comprises a
hafnium disulfide layer, and the encapsulation layer comprises a
hafnium oxide layer. According to the invention, the
plasma oxidation technology is adopted to
package hafnium disulfide with ultrahigh carrier characteristics, so that a
hafnium oxide dielectric layer with a high dielectric constant is formed, a high-quality interface is ensured, the tunneling characteristic of the
field effect transistor is realized, and the performance of the
field effect transistor is improved. And a foundation is laid for finally realizing a low-power-consumption tunneling device of a high-performance nano material in the future.