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Manufacturing method of porous quartz glass base material

A technology of porous quartz and a manufacturing method, applied in glass manufacturing equipment, glass molding, manufacturing tools, etc., can solve problems such as excessive shape change and cracks

Active Publication Date: 2021-10-08
SHIN ETABU QUARTZ PRODS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, for the shape of the seed rods described in Patent Document 2 and Patent Document 3, the change in shape is too large and a large number of cracks are generated. In order to perform stable production, skilled manufacturing operations are required.

Method used

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  • Manufacturing method of porous quartz glass base material
  • Manufacturing method of porous quartz glass base material
  • Manufacturing method of porous quartz glass base material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0053] A hemisphere of R50 was formed by grinding on the tip of a cylindrical unstained quartz rod (diameter φ100 mm), and the surface roughness of the processed surface at this time was Rz=50 μm to prepare a seed rod. The measurement of the surface roughness of the rough surface of the seed rod was performed based on JISB 0601-2001 using a surface roughness meter (small surface roughness measuring machine: Surftest SJ-210, manufactured by Mitutoyo Corporation).

[0054] Using this kind of rod, through the VAD method, the raw material is silicon tetrachloride, the combustible gas is hydrogen, the combustible gas is oxygen, and the non-combustible gas is nitrogen, and then introduced into the concentric multiple tube burner, while burning The soot body is produced while the hydrolysis reaction is carried out in the flame, creating a semi-glazed area. Details of the production conditions are shown in Table 1.

[0055] 【Table 1】

[0056]

[0057] Manufacture 20 soot bodies w...

Embodiment 2

[0060] Form the hemisphere of R50 by grinding on the top of the cylindrical dirt-free quartz rod (diameter φ100mm), and further process the hemisphere at a pitch of 1mm or less to form a concave and convex with a depth d: 0.5mm≤d≤1.5mm. Into a stick.

[0061] Using this kind of rod, through the VAD method, the raw material is silicon tetrachloride, the combustible gas is hydrogen, the combustible gas is oxygen, and the non-combustible gas is nitrogen, and then introduced into the concentric multiple tube burner, while burning The soot body is produced while the hydrolysis reaction is carried out in the flame, creating a semi-glazed area. Details of the production conditions are shown in Table 1.

[0062] A soot body weighing 40 kg excluding the seed rod was manufactured, and it was possible to manufacture the soot body without breaking or cracking and the thickness t of the half-glass region was t=32 mm, which was approximately the same as in Example 1.

[0063] The soot bod...

Embodiment 3

[0065] A hemisphere of R50 was formed by grinding on the tip of a cylindrical unstained quartz rod (diameter φ100 mm), and the surface roughness of the processed surface at this time was Rz=100 μm to prepare a seed rod.

[0066] Using this kind of rod, through the VAD method, the raw material is silicon tetrachloride, the combustible gas is hydrogen, the combustible gas is oxygen, and the non-combustible gas is nitrogen, and then introduced into the concentric multiple tube burner, while burning The soot body is produced while the hydrolysis reaction is carried out in the flame, creating a semi-glazed area. Details of the production conditions are shown in Table 1.

[0067] A soot body weighing 40 kg excluding the seed rod was manufactured, and it was possible to manufacture the soot body without breakage or cracks, and the thickness t of the half-glass region was t=34 mm, which was approximately the same as in Example 1. The same soot body was further fabricated five times, ...

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Abstract

The present invention provides a seed rod capable of easily and inexpensively securing a mechanical strength capable of withstanding a large weight in a VAD method, a method of manufacturing a porous silica glass base material using the seed rod, and a method of manufacturing a silica glass ingot. A method of manufacturing a porous quartz glass base material by depositing glass particles on a rotating seed rod, wherein the seed rod is formed by roughening at least the surface of the tip end of the deposit where the glass particles are deposited. Preferably, the seed rod is a cylindrical seed rod having a hemispherical portion with a hemispherical tip, and is obtained by roughening at least the surface of the hemispherical portion.

Description

technical field [0001] The present invention relates to a method for producing a porous quartz glass base material, a seed rod used in the method, and a method for producing a quartz glass ingot. Background technique [0002] Synthetic quartz glass is widely used in optics, semiconductor, and chemical industries, especially as a lens material for projection or exposure systems in microlithography, as a jig for semiconductor manufacturing, or as a material for optical fibers. [0003] In the manufacture of a synthetic quartz glass ingot, a cylindrical porous quartz glass base material (soot body (Japanese: スート body) is usually produced and sintered to make it transparent. The VAD (Vapor phase Axial Deposition) method is known in the manufacture of a soot body. Soot bodies are produced by transforming silicon-containing raw materials into fine silica particles and depositing them on the surface of rotating seed rods by flame hydrolysis or thermal decomposition. [0004] In th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03B29/00C03B20/00
CPCC03B20/00C03B29/00C03B19/1492C03B37/01493
Inventor 角儿太郎
Owner SHIN ETABU QUARTZ PRODS