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Substrate processing equipment

A substrate processing device and substrate technology, which is applied in the manufacturing of electrical components, circuits, semiconductor/solid-state devices, etc., can solve the problems of liquid splashing, non-reuse, cleaning liquid pollution, etc.

Active Publication Date: 2020-10-09
SCIENTECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when multiple liquid recovery rings collect the liquid thrown off by the rotating substrate, the liquid tends to fly around and splash into another recovery ring that collects another liquid; In this way, the cleaning solution in the recovery ring will be polluted and cannot be reused

Method used

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  • Substrate processing equipment
  • Substrate processing equipment
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Embodiment Construction

[0041] In order to enable your review committee members to better understand the technical content of the present invention, the preferred specific embodiments are described as follows.

[0042] Please refer to the following Figure 1 to Figure 4 Regarding the substrate processing apparatus of the first embodiment of the present invention. figure 1 It is a schematic diagram of recovering the first treatment liquid by the substrate treatment apparatus according to the first embodiment of the present invention; figure 2 It is a schematic diagram of the substrate stage passing through the first cooling part of the substrate processing apparatus according to the first embodiment of the present invention; image 3 It is a schematic diagram of recovering the second processing liquid by the substrate processing apparatus according to the first embodiment of the present invention; Figure 4 It is a system architecture diagram of the substrate processing apparatus according to the f...

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Abstract

A substrate processing device comprises a base and a substrate carrying table, a plurality of collecting units and a resistance single element. The substrate holder can be rotated to be connected withthe base, and the substrate holder is used for fixing and rotating the substrate. The plurality of collecting units are arranged around the periphery of the substrate carrying table, and a pluralityof collecting units are arranged in a fixed mode, each collecting unit is used for collecting a processing solution of the processing substrate. The blocking unit is arranged between the substrate carrying table and the plurality of collecting units. When one of the collecting units corresponds to the substrate carrying table, and the collecting unit is used for collecting the processing liquid which is splashed after the substrate is processed by the processing substrate, and the other collection units are used for collecting the treatment liquid.

Description

technical field [0001] The invention relates to a substrate processing device, in particular to a substrate processing device capable of recovering different processing liquids respectively. Background technique [0002] In the semiconductor process, a substrate processing device is often used to etch or clean the substrate. The substrate processing device has a rotating platform, a liquid application part and a plurality of liquid recovery rings. The rotating platform is used to fix the substrate and allow the substrate to rotate. The liquid applicator is used for applying etching liquid or cleaning liquid to the rotating substrate. A plurality of liquid recovery rings are used to respectively collect the etching liquid or the cleaning liquid thrown off by the rotating substrate, so as to recover the etching liquid or the cleaning liquid and reuse it. However, when multiple liquid recovery rings collect the liquid thrown off by the rotating substrate, the liquid tends to...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67
CPCH01L21/67051H01L21/6708
Inventor 冯傳彰刘茂林
Owner SCIENTECH