Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation method of patterned photonic crystal structure chromogenic material with stable structure and bright color

A photonic crystal, structurally stable technology, applied in optics, optical components, instruments, etc., can solve the problems of dull color, reduced refractive index difference of photonic crystal structure, and reduced color saturation of photonic crystal structure, etc., and achieves strong structural stability. , The structure has bright color and high stability.

Active Publication Date: 2020-06-30
浙江中蝶坊新材料科技股份有限公司
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the above method enhances the stability of the photonic crystal, it usually obviously reduces the saturation of the photonic crystal structure color, making the color dark. The reason is that the filling of the photonic crystal structure with a polymer binder or soft polymer microsphere , and the refractive index of these filled polymers is very close to that of commonly used nano-microspheres (silicon dioxide, polystyrene, etc.), which leads to a decrease in the refractive index difference of the photonic crystal structure, In turn, the saturation of the photonic crystal structural color is reduced
At the same time, conventional photonic crystal preparation methods are difficult to achieve patterned photonic crystal structural color

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of patterned photonic crystal structure chromogenic material with stable structure and bright color
  • Preparation method of patterned photonic crystal structure chromogenic material with stable structure and bright color
  • Preparation method of patterned photonic crystal structure chromogenic material with stable structure and bright color

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] A method for preparing a patterned photonic crystal structure chromogenic material with both stable structure and bright color, the specific steps of the method are:

[0034] (1) Preparation: Put a piece of circular plain polyester fabric with a diameter of 4 cm into an ultrasonic cleaner for cleaning for 5 minutes;

[0035] (2) Dispersing hollow silica microspheres with an inner core diameter of 400nm and a shell thickness of 100nm in water to form a colloidal dispersion with a concentration of 0.2wt%;

[0036] (3) After 10 hours of self-assembly in a constant temperature and humidity chamber at a temperature of 60 degrees Celsius and a relative humidity of 60% by using the gravity sedimentation self-assembly method, a hollow silica photonic crystal structure can be obtained on the surface of the polyester fabric substrate;

[0037] (4) Mix polyurethane diacrylate and hydroxyethyl acrylate at a mass ratio of 20:1, and then add 3% diphenyl (2,4,6-trimethylbenzoyl) phosp...

Embodiment 2

[0039] A method for preparing a patterned photonic crystal structure chromogenic material with both stable structure and bright color, the specific steps of the method are:

[0040] (1) Preparation: Put a piece of circular plain silk fabric with a diameter of 4 cm into an ultrasonic cleaning machine for cleaning for 5 minutes;

[0041] (2) Dispersing hollow silica microspheres with a core diameter of 240nm and a shell thickness of 17nm in water to form a colloidal dispersion with a concentration of 5wt%;

[0042] (3) After self-assembling for 20 hours in a constant temperature and humidity box at a temperature of 60 degrees Celsius and a relative humidity of 60% by using the vertical layered self-assembly method, a hollow silicon dioxide photonic crystal structure can be obtained on the surface of the fabric substrate;

[0043] (4) Mix polyurethane diacrylate and hydroxyethyl methacrylate at a mass ratio of 15:1, and then add 0.2% diphenyl (2,4,6-trimethylbenzoyl) Phosphine o...

Embodiment 3

[0047] A method for preparing a patterned photonic crystal structure chromogenic material with both stable structure and bright color, the specific steps of the method are:

[0048] (1) Preparation: Put a piece of circular plain nylon fabric with a diameter of 4 cm into an ultrasonic cleaner for 5 minutes;

[0049] (2) Dispersing hollow silica microspheres with an inner core diameter of 100nm and a shell thickness of 5nm in water to form a colloidal dispersion with a concentration of 10wt%;

[0050] (3) Use the vertical pulling method to vertically immerse the fabric into the colloidal dispersion liquid and slowly pull it to the liquid surface at a speed of 2mm / s and then infiltrate it. After 50 cycles, hollow silica photons can be obtained on the surface of the fabric substrate. Crystal structure.

[0051] (4) Mix polyurethane diacrylate and polyethylene glycol diacrylate at a mass ratio of 10:1, and then add 4% diphenyl (2,4,6-trimethylbenzoyl ) phosphine oxide as a photoi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
thicknessaaaaaaaaaa
particle diameteraaaaaaaaaa
Login to View More

Abstract

The invention relates to a preparation method for a patterned photonic crystal structural coloration material with stable structure and bright color, and belongs to the field of preparation of structural coloration materials. The method comprises the following steps of (1) preparing a hollow nano-microsphere colloidal dispersion liquid; (2) constructing a hollow nano-microsphere photonic crystal structure on the surface of a base material by adopting a colloidal microsphere self-assembly method or a spraying method; (3) preparing curable ink, performing selective application processing on thehollow nano-microsphere photonic crystal structure, and curing the ink through light or heat, wherein the curable ink is light-cured or heat-cured ink; and (4) removing hollow nano-microsphere photonic crystals of an uncured part through ultrasonic washing or soaping. According to the method, the photonic crystals are self-assembled by adopting hollow nano-microspheres, the curable ink is preparedand the hollow nano-microsphere photonic crystal structure is subjected to the selective application processing, so that the high-stability and high-saturation patterned photonic crystal structure coloration material is obtained.

Description

technical field [0001] The invention relates to a photonic crystal structure chromogenic material, in particular to a method for preparing a patterned photonic crystal structural chromogenic material with both structural stability and bright colors, and belongs to the field of structural chromogenic material preparation. Background technique [0002] Different from the color-producing mechanism of traditional pigments such as dyes or pigments, the generation of structural color is due to physical effects such as diffraction, interference, and scattering of the object's special micro-nano structure and visible light. Compared with pigment coloring, the processing process of structural coloring has lower energy consumption and less pollution, and is an environmentally friendly green coloring method; structural color usually also has bright, bright, flexible and changeable coloring effects, with metallic Gloss, along with the iridescence effect (the phenomenon in which color ch...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/00
CPCG02B1/005
Inventor 邵建中李义臣王晓辉周岚柴丽琴
Owner 浙江中蝶坊新材料科技股份有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com